⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8370594 | 0.76 | — | — | |
| SCHEMBL7049680 | 0.76 | — | — | |
| SCHEMBL6674676 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL5612572 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL27956360 | 0.71 | — | — | |
| SCHEMBL4651454 | 0.69 | — | — | |
| SCHEMBL7622836 | 0.68 | — | — | |
| SCHEMBL7945971 | 0.68 | — | — | |
| SCHEMBL7632162 | 0.68 | — | — | |
| SCHEMBL61232 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7329768-B2 | Chemical vapor deposition precursors for deposition of tantalum-based materials | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-02-12 | — | — | US | disclosed |
| US-20060135803-A1 | Chemical vapor deposition precursors for deposition of tantalum-based materials | MORGAN STANLEY SENIOR FUNDING, INC. | 2006-06-22 | — | — | US | disclosed |
| US-6989457-B2 | Chemical vapor deposition precursors for deposition of tantalum-based materials | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-01-24 | — | — | US | disclosed |
| EP-1599488-A2 | CHEMICAL VAPOR DEPOSITION PRECURSORS FOR DEPOSITION OF TANTALUM-BASED MATERIALS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2005-11-30 | — | — | EP | disclosed |
| WO-2004065650-A2 | CHEMICAL VAPOR DEPOSITION PRECURSORS FOR DEPOSITION OF TANTALUM-BASED MATERIALS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2004-08-05 | — | — | WO | disclosed |
| US-20040142555-A1 | Chemical vapor deposition precursors for deposition of tantalum-based materials | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2004-07-22 | — | — | US | disclosed |