Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.30 |
| ▸ | CYP2E1 | P05181 | 1/20 | 0.30 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | GSDMD | P57764 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3084671 | 0.67 | ABCB11 (0.36) | CA1CA2ABCB11CYP2E1PTGS1 | |
| SCHEMBL4874806 | 0.63 | — | — | |
| SCHEMBL9790001 | 0.62 | — | — | |
| SCHEMBL5052393 | 0.61 | ABCB11 (0.43) | ABCB11CYP2E1PTGS1HTTGSDMD | |
| SCHEMBL735597 | 0.57 | — | — | |
| SCHEMBL28889018 | 0.55 | — | — | |
| SCHEMBL693622 | 0.55 | — | — | |
| SCHEMBL37535 | 0.55 | — | — | |
| SCHEMBL5872723 | 0.55 | — | — | |
| Carbonotrithioic Acid SCHEMBL5146473 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7452426-B2 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-11-18 | — | — | US | disclosed |
| US-20080000505-A1 | Processing of semiconductor components with dense processing fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-01-03 | — | — | US | disclosed |
| US-20080004194-A1 | Processing of semiconductor components with dense processing fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-01-03 | — | — | US | disclosed |
| US-7267727-B2 | Processing of semiconductor components with dense processing fluids and ultrasonic energy | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-09-11 | — | — | US | disclosed |
| US-20070137675-A1 | Method for removal of flux and other residue in dense fluid systems | VERSUM MATERIALS US, LLC | 2007-06-21 | — | — | US | disclosed |
| US-7211553-B2 | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-05-01 | — | — | US | disclosed |
| US-7208049-B2 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-04-24 | — | — | US | disclosed |
| US-7195676-B2 | Method for removal of flux and other residue in dense fluid systems | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-03-27 | — | — | US | disclosed |
| US-20070006894-A1 | Contacting the substrate with a process solution of surfactants; reducing the number of defects in the manufacture of semiconductor devices; reducting dynamic surface tension while minimizing foaming | VERSUM MATERIALS US, LLC | 2007-01-11 | — | — | US | disclosed |
| US-20060081273-A1 | Dense fluid compositions and processes using same for article treatment and residue removal | AIR PRODUCTS AND CHEMICALS, INC. | 2006-04-20 | — | — | US | disclosed |
| US-20060011217-A1 | Method for removal of flux and other residue in dense fluid systems | AIR PRODUCTS AND CHEMICALS, INC. | 2006-01-19 | — | — | US | disclosed |
| EP-1548810-A2 | Processing of semiconductor components with dense processing fluids and ultrasonic energy | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-06-29 | — | — | EP | disclosed |
| EP-1530232-A2 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-05-11 | — | — | EP | disclosed |
| US-20050081885-A1 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment | VERSUM MATERIALS US, LLC | 2005-04-21 | — | — | US | disclosed |
| US-20050029492-A1 | Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols | VERSUM MATERIALS US, LLC | 2005-02-10 | — | — | US | disclosed |
| US-20050029490-A1 | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols | VERSUM MATERIALS US, LLC | 2005-02-10 | — | — | US | disclosed |
| EP-1505146-A1 | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-02-09 | — | — | EP | disclosed |
| US-20040144399-A1 | Processing of semiconductor components with dense processing fluids and ultrasonic energy | AIR PRODUCTS AND CHEMICALS, INC. | 2004-07-29 | — | — | US | disclosed |