⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10314775 | 1.00 | — | — | |
| SCHEMBL10314780 | 1.00 | — | — | |
| SCHEMBL15892758 | 0.81 | KDM4E (0.39) | — | |
| SCHEMBL3196665 | 0.81 | — | — | |
| SCHEMBL25174850 | 0.78 | — | — | |
| SCHEMBL13506749 | 0.77 | — | — | |
| SCHEMBL19331620 | 0.74 | — | — | |
| SCHEMBL10052022 | 0.74 | — | — | |
| SCHEMBL17231293 | 0.74 | — | — | |
| SCHEMBL813851 | 0.74 | FDPS (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 255 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120118661-A | Thermal interface material, preparation method and application | 深圳先进电子材料国际创新研究院 | 2025-06-10 | — | — | CN | claimed |
| CN-117624902-A | High-reliability thermal interface material and preparation method and application thereof | 深圳先进电子材料国际创新研究院 | 2024-03-01 | — | — | CN | claimed |
| US-10964541-B2 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2021-03-30 | — | — | US | claimed |
| US-20200090936-A1 | METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR EXTREME ULTRAVIOLET AND ELECTRON BEAM LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2020-03-19 | — | — | US | claimed |
| US-10553432-B2 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-02-04 | — | — | US | claimed |
| US-10312087-B2 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-06-04 | — | — | US | claimed |
| US-20180337048-A1 | METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR EXTREME ULTRAVIOLET AND ELECTRON BEAM LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2018-11-22 | — | — | US | claimed |
| US-10096477-B2 | Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-10-09 | — | — | US | claimed |
| US-7727692-B2 | Electrophotographic photoreceptor, image forming apparatus, and process cartridge | FUJI XEROX CO., LTD. (JP) | 2010-06-01 | — | — | US | claimed |
| US-20080166615-A1 | COOLING LIQUID COMPOSITION FOR FUEL CELL | SHISHIAI-KABUSHIKIGAISHA (JP) | 2008-07-10 | — | — | US | claimed |
| US-20060145120-A1 | Cooling liquid composition for fuel cell | SHISHIAI-KABUSHIKIGAISHA (JP) | 2006-07-06 | — | — | US | claimed |
| EP-1653544-A1 | COOLING LIQUID COMPOSITION FOR FUEL CELL | Shishiai-Kabushikigaisha (JP) | 2006-05-03 | — | — | EP | claimed |
| EP-0882080-B1 | WATER-DISPERSIBLE POLYMER AND COATING COMPOSITION CONTAINING THE SAME | DEXTER CORP (US) | 2001-07-11 | — | — | EP | claimed |
| US-5922817-A | COATING WHICH PROVIDES CORROSION RESISTANCE TO A METAL SUBSTRATE AND EXHIBITS EXCELLENT FLEXIBILITY, CHEMICAL RESISTANCE AND ADHESION | THE DEXTER CORPORATION (US) | 1999-07-13 | — | — | US | claimed |
| US-5869552-A | HAVING STRUCTURE WITH EPOXY PORTION LINKED TO ACRYLIC PORTION BY COMPOUND HAVING EITHER CONJUGATED DOUBLE BONDS OR TRIPLE BOND AND MOIETY CAPABLE OF REACTING WITH EPOXY GROUP | THE DEXTER CORPORATION (US) | 1999-02-09 | — | — | US | claimed |
| EP-0882080-A1 | WATER-DISPERSIBLE POLYMER AND COATING COMPOSITION CONTAINING THE SAME | THE DEXTER CORPORATION (US) | 1998-12-09 | — | — | EP | claimed |
| US-5830952-A | ACRYLIC POLYMERS LINKED TO EPOXY COMPOUNDS OR POLYMERS | THE DEXTER CORPORATION (US) | 1998-11-03 | — | — | US | claimed |
| WO-1997031044-A1 | WATER-DISPERSIBLE POLYMER AND COATING COMPOSITION CONTAINING THE SAME | THE DEXTER CORPORATION (US) | 1997-08-28 | — | — | WO | claimed |
| EP-4711424-A1 | AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND WRITING UTENSIL OBTAINED USING SAME | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2026-03-18 | — | — | EP | disclosed |
| US-3950406-A | BRONCHODILATORS, HYPOTENSIVE, ANTIULCER | AMERICAN CYANAMID COMPANY (US) | 1976-04-13 | — | — | US | disclosed |