SCHEMBL48799

SCHEMBL48799

[c]1ccc(C=Cc2ccccc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.52
NFE2L2 Q16236 4/20 0.50
CYP19A1 P11511 2/20 0.50
MAOA P21397 2/20 0.50
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
CHAT P28329 2/20 0.46
TRPA1 O75762 3/20 0.44
RELA Q04206 2/20 0.44
CYP11B1 P15538 1/20 0.44
CYP11B2 P19099 1/20 0.44
ALDH1A1 P00352 2/20 0.44
LMNA P02545 1/20 0.44
ALOX5 P09917 1/20 0.44
MAPK1 P28482 1/20 0.44
KDM4E B2RXH2 1/20 0.43
HPGD P15428 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL920604 1.00 MAOB (0.52) MAOBNFE2L2CYP19A1MAOAMEN1
SCHEMBL210538 1.00 MAOB (0.52) MAOBNFE2L2CYP19A1MAOAMEN1
SCHEMBL28048995 0.97 MAOB (0.50) MAOBNFE2L2CYP19A1MAOAMEN1
SCHEMBL4074475 0.97 MAOB (0.54) MAOBNFE2L2CYP19A1MAOAMEN1
Styrene SCHEMBL28126887 0.89 ALDH1A1 (0.61) MAOBNFE2L2CYP19A1MAOAMEN1
SCHEMBL152100 0.88 MAOB (0.33) MAOBNFE2L2CYP19A1MAOAMEN1
SCHEMBL210914 0.88 MAOB (0.33) MAOBNFE2L2CYP19A1MAOAMEN1
SCHEMBL28254485 0.87 ALDH1A1 (0.58) MAOBNFE2L2CYP19A1MAOAMEN1
SCHEMBL8029201 0.85 MAOB (0.48) MAOBNFE2L2CYP19A1MAOAMEN1
(Z)-1,2-Diphenylethene SCHEMBL28743228 0.85 MAOB (0.69) MAOBNFE2L2CYP19A1MAOAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3486 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114478842-B Emulsion polymerization emulsifier composition and emulsion polymerization system 亚士创能科技(上海)股份有限公司 2024-04-30 CN claimed
CN-117642697-A Curable resin composition, laminate, cured product, and electronic component 太阳油墨(苏州)有限公司 2024-03-01 CN claimed
CN-111226325-B Top emission type organic electroluminescent element, organic electroluminescent device, and electronic device 出光兴产株式会社 2023-08-15 CN claimed
CN-115903378-A Curable resin composition, dry film, cured product, and electronic component 太阳油墨(苏州)有限公司 2023-04-04 CN claimed
CN-111196775-B D-pi-A type organic small molecular dye based on di (4-styrylphenyl) aniline, and synthesis method and application thereof 南京理工大学 2022-11-15 CN claimed
CN-114478842-A Emulsion polymerization emulsifier composition and emulsion polymerization system 亚士创能科技(上海)股份有限公司 2022-05-13 CN claimed
CN-107340687-B Composition for hard mask 东友精细化工有限公司 2022-01-25 CN claimed
WO-2021060082-A1 DETERGENT COMPOSITION FOR TEXTILE PRODUCTS 小林製薬株式会社 2021-04-01 WO claimed
CN-106848074-B Organic electroluminescent element and electronic device 出光兴产株式会社 2020-08-18 CN claimed
CN-111196775-A D-pi-A type organic small molecular dye based on di (4-styrylphenyl) aniline, synthetic method and application 南京理工大学 2020-05-26 CN claimed
US-4906551-A Process for the post-treatment of developed relief printing forms for use in flexographic printing HOECHST AKTIENGESELLSCHAFT (DE) 1990-03-06 US claimed
US-4892799-A PHOTOCONDUCTIVITY, ELECTROGRAPHY HOECHST AKTIENGESELLSCHAFT (DE) 1990-01-09 US claimed
EP-0341720-A2 Light-sensitive compositions Fuji Photo Film Co., Ltd. (JP) 1989-11-15 EP claimed
EP-0281012-A1 4-Chloro-oxazole derivatives, method for their preparation and their use HOECHST AKTIENGESELLSCHAFT (DE) 1988-09-07 EP claimed
US-4657942-A LITHOGRAPHIC PRINTING PLATES, RESIN LETTERPRESS, RESISTS, 2-MERCAPTO-1,3,4-TIADIAZOLE FOR INCREASED SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 1987-04-14 US claimed
EP-0149802-A2 2,3-Bis(arylethényl)quinoxalines, process for their preparation and their use as photoconducting compounds HOECHST AKTIENGESELLSCHAFT (DE) 1985-07-31 EP claimed
US-4371606-A 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives HOECHST AKTIENGESELLSCHAFT (DE) 1983-02-01 US claimed
EP-0000346-A1 Quinoxaline compounds, process for their manufacture and their use as brighteners for organic materials, and the materials brightened therewith BAYER AG (DE) 1979-01-24 EP claimed
US-4122257-A Benzofuran-oxadiazole compounds HOECHST AKTIENGESELLSCHAFT (DE) 1978-10-24 US claimed
US-4097515-A Process for the manufacture of cyano-substituted stilbene compounds CIBA-GEIGY CORPORATION (US) 1978-06-27 US claimed