SCHEMBL4880552

SCHEMBL4880552

CCCCCCCCCCCCCCCCN(C)CCCO

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.57
ALDH1A1 P00352 2/20 0.57
HSD17B10 Q99714 1/20 0.57
MEN1 O00255 1/20 0.57
KMT2A Q03164 1/20 0.57
TSHR P16473 1/20 0.57
S1PR2 O95136 1/20 0.55
S1PR1 P21453 1/20 0.55
S1PR3 Q99500 1/20 0.55
S1PR5 Q9H228 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.52
DNM1 Q05193 3/20 0.52
GGPS1 O95749 4/20 0.47
KDM5A P29375 2/20 0.46
KDM4C Q9H3R0 2/20 0.46
PHF8 Q9UPP1 1/20 0.46
FDPS P14324 1/20 0.46
AGTR1 P30556 1/20 0.46
OPRM1 P35372 1/20 0.46
PDE3A Q14432 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20756484 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL29174000 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL7626625 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL27685183 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL10398804 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL1403868 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL23016786 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL1403908 1.00 LMNA (0.57) LMNAALDH1A1HSD17B10MEN1KMT2A
Hydrochloric Acid SCHEMBL28919673 0.98 LMNA (0.55) LMNAALDH1A1HSD17B10MEN1KMT2A
Hydrochloric Acid SCHEMBL28287185 0.98 LMNA (0.55) LMNAALDH1A1HSD17B10MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080171440-A1 Pre-polishing treatment solution for interconnect substrate, polishing method, and method and apparatus for manufacturing interconnect substrate EBARA CORPORATION (JP) 2008-07-17 US disclosed