Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL28064757 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL28169600 | 0.87 | — | — | |
| Fluoride Ion SCHEMBL24361 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL14738839 | 0.82 | CYP3A4 (0.33) | — | |
| Hydrochloric Acid SCHEMBL6914388 | 0.82 | CYP3A4 (0.33) | — | |
| Hydrochloric Acid SCHEMBL17260895 | 0.82 | CYP3A4 (0.33) | — | |
| Fluoride Ion SCHEMBL5392118 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL15668453 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL4289662 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL10714977 | 0.82 | CYP3A4 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1211256-B1 | Method for purifying fluoroaryl metal compound | NIPPON CATALYTIC CHEM IND (JP) | 2006-08-02 | — | — | EP | claimed |
| US-6509488-B2 | Magnesium halide is precipitated and removed from solution containing fluoroaryl metal compound, magnesium halide, and ether solvent, or magnesium halide is removed by treating solution with acid | NIPPON SHOKUBAI CO., LTD. (JP) | 2003-01-21 | — | — | US | claimed |
| EP-1211256-A2 | Method for purifying fluoroaryl metal compound | Nippon Shokubai Co., Ltd. (JP) | 2002-06-05 | — | — | EP | claimed |
| US-20020065425-A1 | Method for purifying fluoroaryl metal compound | NIPPON SHOKUBAI CO., LTD. (JP) | 2002-05-30 | — | — | US | claimed |
| US-4766948-A | REDUCTION O SPACING IN DENRITIC STRUCTURE BY CASTING IN CERAMIC MOLD COATED WITH GROUP 1B OR 2B HALIDES | THYSSEN INDUSTRIE AG (DE) | 1988-08-30 | — | — | US | claimed |
| WO-2023230329-A1 | LUMINESCENT DIAMOND WITH NEGATIVELY CHARGED VACANCIES | SCHLUMBERGER TECHNOLOGY CORPORATION (US) | 2023-11-30 | — | — | WO | disclosed |
| CN-111004087-A | Post-treatment method of trifluorostyrene synthetic liquid | 常熟三爱富中昊化工新材料有限公司 | 2020-04-14 | — | — | CN | disclosed |
| EP-1817318-B1 | STABILIZING METHOD AND STABILIZED COMPOSITION FOR ARYL BORON COMPOUNDS | NIPPON CATALYTIC CHEM IND (JP) | 2013-08-28 | — | — | EP | disclosed |
| US-20080154065-A1 | Stabilizing Method and Stabilized Composition for Aryl Boron Compounds | NIPPON SHOKUBAI CO., LTD. (JP) | 2008-06-26 | — | — | US | disclosed |
| EP-1817318-A1 | STABILIZING METHOD AND STABILIZED COMPOSITION FOR ARYL BORON COMPOUNDS | Nippon Shokubai Co.,Ltd. (JP) | 2007-08-15 | — | — | EP | disclosed |
| WO-2006080538-A1 | STABILIZING METHOD AND STABILIZED COMPOSITION FOR ARYL BORON COMPOUNDS | NIPPON SHOKUBAI CO., LTD. (JP) | 2006-08-03 | — | — | WO | disclosed |
| EP-1211256-B1 | Method for purifying fluoroaryl metal compound | NIPPON CATALYTIC CHEM IND (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-20020065425-A1 | Method for purifying fluoroaryl metal compound | NIPPON SHOKUBAI CO., LTD. (JP) | 2002-05-30 | — | — | US | disclosed |
| US-6281389-B1 | MIXING WITH SOLVENT; DISTILLATION | NIPPON SHOKUBAI CO., LTD. (JP) | 2001-08-28 | — | — | US | disclosed |
| US-6118026-A | Stabilizer for (fluoroaryl)borane compound and methods of stabilizing and crystallizing (fluoroaryl)borane compound | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-09-12 | — | — | US | disclosed |
| EP-0985672-A2 | Method for purifying tetrakis(fluoroaryl)borate compounds | Nippon Shokubai Co., Ltd. (JP) | 2000-03-15 | — | — | EP | disclosed |
| EP-0889047-A2 | Stabilizer for (fluoroaryl) borane compound and methods of stabilizing and crystallizing (fluoroaryl) borane compound | Nippon Shokubai Co., Ltd. (JP) | 1999-01-07 | — | — | EP | disclosed |
| US-5510536-A | Production method of tris(pentafluorophenyl)borane using pentafluorophenylmagnesium derivatives prepared from pentafluorobenzene | TOSOH AKZO CORPORATION (JP) | 1996-04-23 | — | — | US | disclosed |
| EP-0604963-A1 | Production method of tris(pentafluorophenyl)borane using pentafluorophenylmagnesium derivatives prepared from pentafluorobenzene | TOSOH AKZO CORPORATION (JP) | 1994-07-06 | — | — | EP | disclosed |
| US-4766948-A | REDUCTION O SPACING IN DENRITIC STRUCTURE BY CASTING IN CERAMIC MOLD COATED WITH GROUP 1B OR 2B HALIDES | THYSSEN INDUSTRIE AG (DE) | 1988-08-30 | — | — | US | disclosed |