SCHEMBL4884361

SCHEMBL4884361

C[C](C1CCCC(O)C1)C1CCCC(O)C1

nearest known ligand 0.38

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38
LMNA P02545 1/20 0.33
CYP2C9 P11712 1/20 0.33
NOS2 P35228 1/20 0.31
CNR2 P34972 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4889680 0.95 TSHR (0.45) TSHRLMNACYP2C9NOS2
SCHEMBL4893287 0.84 TSHR (0.38) TSHRLMNACYP2C9NOS2CNR2
SCHEMBL4888688 0.83 LMNA (0.36) LMNACYP2C9
SCHEMBL20248617 0.80 TSHR (0.35) TSHRLMNACYP2C9
SCHEMBL19871213 0.80 TSHR (0.35) TSHRLMNACYP2C9
SCHEMBL24690877 0.80 TSHR (0.35) TSHRLMNACYP2C9
SCHEMBL30939430 0.80 TSHR (0.35) TSHRLMNACYP2C9
SCHEMBL24690456 0.80 TSHR (0.35) TSHRLMNACYP2C9
SCHEMBL10277080 0.80 TSHR (0.35) TSHRLMNACYP2C9
SCHEMBL19871214 0.80 TSHR (0.35) TSHRLMNACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20080026314-A1 Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-01-31 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
EP-1720064-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2006-11-08 EP disclosed
US-20060223001-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-05 US disclosed
EP-1679314-A1 SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-07-12 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed