⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1785347 | 0.70 | — | — | |
| SCHEMBL7158482 | 0.70 | HDAC2 (0.43) | — | |
| SCHEMBL2988371 | 0.69 | — | — | |
| SCHEMBL1357104 | 0.69 | MCL1 (0.45) | — | |
| SCHEMBL27639267 | 0.68 | — | — | |
| SCHEMBL242415 | 0.68 | — | — | |
| SCHEMBL14398568 | 0.68 | — | — | |
| SCHEMBL28000893 | 0.68 | — | — | |
| SCHEMBL3628741 | 0.67 | MAPT (0.32) | — | |
| SCHEMBL172482 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080131812-A1 | Resin for printing plate material and lithographic printing plate material by use thereof | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2008-06-05 | — | — | US | disclosed |
| EP-1441256-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-0789278-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-05-04 | — | — | EP | disclosed |
| EP-1441256-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2004-07-28 | — | — | EP | disclosed |
| US-6727032-B1 | USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. | JSR CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-6692887-B1 | COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY | JSR CORPORATION (JP) | 2004-02-17 | — | — | US | disclosed |
| US-6382125-B1 | Temperature control material and temperature control method using the same | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2002-05-07 | — | — | US | disclosed |
| EP-0443533-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1998-09-30 | — | — | EP | disclosed |
| US-5753406-A | ALKALI-SOLUBLE NOVOLAK RESIN, 1,2-QUINONEDIAZIDE COMPOUND, AND SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-19 | — | — | US | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5482816-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-01-09 | — | — | US | disclosed |
| US-5478691-A | Blend of alkali-soluble novolak resin and 1,2-quinonediazidecompound | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| EP-0365318-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-03-16 | — | — | EP | disclosed |
| EP-0443533-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-28 | — | — | EP | disclosed |
| EP-0365318-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-04-25 | — | — | EP | disclosed |
| US-4015017-A | Certain biphenyl derivatives used to treat disorders caused by increased capillary permeability | LABORATOIRES PHARMASCIENCE (FR) | 1977-03-29 | — | — | US | disclosed |