SCHEMBL4889693

SCHEMBL4889693

CC(C1CCCCC(O)C1)C1CCCCC(O)C1

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.43
DPP4 P27487 3/20 0.39
DPP7 Q9UHL4 3/20 0.39
LMNA P02545 1/20 0.37
CYP2C9 P11712 1/20 0.37
SHBG P04278 2/20 0.32
CA12 O43570 2/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
MMP2 P08253 2/20 0.31
CA9 Q16790 2/20 0.31
EPHX1 P07099 1/20 0.30
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4884365 0.95 DPP4 (0.43) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL4840491 0.85 TSHR (0.43) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL4888692 0.84 SHBG (0.42) DPP4DPP7LMNACYP2C9SHBG
SCHEMBL4836092 0.83 TSHR (0.41) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL23265522 0.80 DPP4 (0.43) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL255297 0.80 DPP4 (0.43) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL20696926 0.80 DPP4 (0.43) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL24126295 0.80 DPP4 (0.43) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL14588833 0.80 DPP4 (0.43) TSHRDPP4DPP7LMNACYP2C9
SCHEMBL12384256 0.80 DPP4 (0.43) TSHRDPP4DPP7LMNACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20080026314-A1 Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-01-31 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
EP-1720064-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2006-11-08 EP disclosed
US-20060223001-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-05 US disclosed
EP-1679314-A1 SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-07-12 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed