Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.51 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | APEX1 | P27695 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3504972 | 0.97 | ALDH1A1 (0.54) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL189712 | 0.91 | ALDH1A1 (0.61) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL9447782 | 0.91 | ALDH1A1 (0.61) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| SCHEMBL8067939 | 0.90 | ALDH1A1 (0.49) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| Ethylene Glycol SCHEMBL28231454 | 0.89 | ALDH1A1 (0.59) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| SCHEMBL17216232 | 0.88 | TSHR (0.54) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| SCHEMBL13234388 | 0.87 | ALDH1A1 (0.66) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| SCHEMBL13234404 | 0.87 | ALDH1A1 (0.66) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| SCHEMBL13234425 | 0.87 | ALDH1A1 (0.66) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 | |
| SCHEMBL13234392 | 0.87 | ALDH1A1 (0.66) | ALDH1A1LMNASMN1; SMN2TDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024144281-A1 | PIXEL DEFINITION LAYER MANUFACTURING METHOD | 덕산네오룩스 주식회사 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024085389-A1 | METHOD FOR MANUFACTURING PIXEL-DEFINING LAYER | 덕산네오룩스 주식회사 | 2024-04-25 | — | — | WO | disclosed |
| WO-2024085390-A1 | METHOD FOR MANUFACTURING PIXEL DEFINITION LAYER | 덕산네오룩스 주식회사 | 2024-04-25 | — | — | WO | disclosed |
| WO-2024085388-A1 | METHOD FOR MANUFACTURING PIXEL-DEFINING LAYER | 덕산네오룩스 주식회사 | 2024-04-25 | — | — | WO | disclosed |
| WO-2024058334-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM MANUFACTURED USING SAME, AND COLOR FILTER | 삼성에스디아이 주식회사 | 2024-03-21 | — | — | WO | disclosed |
| WO-2024048892-A1 | COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING SAME, AND COLOR FILTER | 삼성에스디아이 주식회사 | 2024-03-07 | — | — | WO | disclosed |
| WO-2023200045-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER PREPARED USING SAME, AND COLOR FILTER | 삼성에스디아이 주식회사 | 2023-10-19 | — | — | WO | disclosed |
| WO-2022260283-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM USING SAME, COLOR FILTER AND DISPLAY DEVICE | 삼성에스디아이 주식회사 | 2022-12-15 | — | — | WO | disclosed |
| CN-105164577-B | Liquid crystal display device and base board for display device | 凸版印刷株式会社 | 2018-03-27 | — | — | CN | disclosed |
| CN-103869618-B | For colored filter photosensitive resin composition and use its colored filter | 第毛织株式会社 | 2017-10-31 | — | — | CN | disclosed |
| CN-102279528-A | Blue color resin composition for color filter and color filter using the same | — | 2011-12-14 | — | — | CN | disclosed |
| US-20080179572-A1 | Photosensitive Resin Composition for Producing Color Filter and Color Filter for Image Sensor Produced Using the Composition | CHEIL INDUSTRIES INC. (KR) | 2008-07-31 | — | — | US | disclosed |
| US-20080171271-A1 | Photosensitive Resin Composition for Producing Color Filter and Color Filter for Image Sensor Produced Using the Composition | CHEIL INDUSTRIES INC. (KR) | 2008-07-17 | — | — | US | disclosed |
| US-20080020300-A1 | Photosensitive Resin Composition for Color Filter of Image Sensor and Color Filter of Image Sensor Using the Same | CHEIL INDUSTRIES INC. | 2008-01-24 | — | — | US | disclosed |
| US-6503694-B1 | Water, base, and nonionic surfactant comprising (poly)oxyalkylene glycol alkylphenol; actinic ray-sensitive resists; printed and integrated circuits | CHI MEI CORPORATION (TW) | 2003-01-07 | — | — | US | disclosed |
| US-20020119263-A1 | Radiation sensitive composition for color filters, production process therefor, color filter and color liquid crystal display element | JSR CORPORATION (JP) | 2002-08-29 | — | — | US | disclosed |
| US-6255034-B1 | (A) A COLORANT, (B) A BINDER POLYMER, (C) A POLYFUNCTIONAL MONOMER AND (D) AN UNSATURATED AMIDE GROUP-CONTAINING MONOMER OR AN UNSATURATED MONOMER HAVING A CYCLIC AMIDE OR IMIDE GROUP, AND (E) A PHOTOPOLYMERIZATION INITIATOR. | JSR CORPORATION (JP) | 2001-07-03 | — | — | US | disclosed |
| US-6013415-A | Radiation sensitive composition | JSR CORPORATION (JP) | 2000-01-11 | — | — | US | disclosed |
| EP-0902327-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0702271-A1 | Positive working printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |