⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17133787 | 1.00 | — | — | |
| SCHEMBL17133774 | 1.00 | — | — | |
| SCHEMBL4451800 | 0.97 | — | — | |
| Ethylene SCHEMBL4170924 | 0.86 | EPHX2 (0.32) | — | |
| SCHEMBL987686 | 0.86 | EPHX2 (0.33) | — | |
| SCHEMBL317547 | 0.86 | EPHX2 (0.33) | — | |
| SCHEMBL987158 | 0.86 | EPHX2 (0.33) | — | |
| SCHEMBL863208 | 0.86 | EPHX2 (0.33) | — | |
| SCHEMBL863289 | 0.86 | EPHX2 (0.33) | — | |
| SCHEMBL985625 | 0.86 | EPHX2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116535900-A | Radiation curable inkjet composition and inkjet recording method | 精工爱普生株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-111886545-A | Photocurable/thermosetting resin composition, dry film, cured product, and printed wiring board | 太阳油墨制造株式会社 | 2020-11-03 | — | — | CN | disclosed |
| CN-110951321-A | Radiation-curable inkjet composition and inkjet recording method | 精工爱普生株式会社 | 2020-04-03 | — | — | CN | disclosed |
| EP-2927250-B1 | (FUMARIC ACID DIESTER)-(CINNAMIC ACID ESTER) COPOLYMER, METHOD FOR PRODUCING SAME, AND FILM PRODUCED USING SAME | TOSOH CORP (JP) | 2017-08-16 | — | — | EP | disclosed |
| US-9512284-B2 | Fumaric acid diester-cinnamic acid ester-based copolymer, production method thereof and film using the same | TOSOH CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20150291751-A1 | FUMARIC ACID DIESTER-CINNAMIC ACID ESTER-BASED COPOLYMER, PRODUCTION METHOD THEREOF AND FILM USING THE SAME | TOSOH CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| EP-2927250-A1 | (FUMARIC ACID DIESTER)-(CINNAMIC ACID ESTER) COPOLYMER, METHOD FOR PRODUCING SAME, AND FILM PRODUCED USING SAME | Tosoh Corporation (JP) | 2015-10-07 | — | — | EP | disclosed |
| EP-1781245-B1 | METHOD FOR PERMANENT HAIR PROCESSING | SHOWA DENKO KK (JP) | 2012-11-14 | — | — | EP | disclosed |
| US-20080131389-A1 | Hair Relaxer | SHOWA DENKO K.K. (JP) | 2008-06-05 | — | — | US | disclosed |
| US-20080031839-A1 | Agent For Prermanent Hair Processing | SHOWA DENKO K.K. (JP) | 2008-02-07 | — | — | US | disclosed |
| EP-0757032-B1 | Naphthalene compound, and liquid crystal composition and liquid crystal element using the same | MITSUI CHEMICALS INC (JP) | 2001-12-12 | — | — | EP | disclosed |
| EP-0751133-B1 | Pyrimidine compound, and liquid crystal composition and liquid crystal element using the same | MITSUI CHEMICALS INC (JP) | 2001-09-12 | — | — | EP | disclosed |
| EP-1120399-A1 | Naphthalene compound, and liquid crystal composition and liquid crystal element using the same | Mitsui Chemicals, Inc. (JP) | 2001-08-01 | — | — | EP | disclosed |
| EP-1120400-A1 | Naphtahlene compound, and liquid crystal composition and liquid crystal element using the same | Mitsui Chemicals, Inc. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-6217793-B1 | Acetylene compound, liquid crystal composition and liquid crystal element | MITSUI CHEMICALS, INC. (JP) | 2001-04-17 | — | — | US | disclosed |
| EP-0962445-A1 | Acetylene compound, liquid crystal composition and liquid crystal element | Mitsui Chemicals, Inc. (JP) | 1999-12-08 | — | — | EP | disclosed |
| US-5861108-A | IMPROVES HIGH SPEED RESPONSE PROPERTY AND TEMPERATURE DEPENDENCY OF THE RESPONSE TIME | MITSUI CHEMICALS, INC. (JP) | 1999-01-19 | — | — | US | disclosed |
| US-5770108-A | HIGH SPEED RESPONSE, MOLECULAR ORIENTATION, HIGH CONTRAST, RECEPTIVITY | MITSUI TOATSU CHEMICALS, INC. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0757032-A2 | Naphthalene compound, and liquid crystal composition and liquid crystal element using the same | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-02-05 | — | — | EP | disclosed |
| EP-0751133-A1 | Pyrimidine compound, and liquid crystal composition and liquid crystal element using the same | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1997-01-02 | — | — | EP | disclosed |