Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A1 | P43005 | 3/20 | 0.42 |
| ▸ | GSR | P00390 | 2/20 | 0.42 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.42 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.42 |
| ▸ | GRM8 | O00222 | 1/20 | 0.42 |
| ▸ | GRM6 | O15303 | 1/20 | 0.42 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.42 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.42 |
| ▸ | GRM5 | P41594 | 1/20 | 0.42 |
| ▸ | GRIA1 | P42261 | 1/20 | 0.42 |
| ▸ | GRIA2 | P42262 | 1/20 | 0.42 |
| ▸ | GRIA3 | P42263 | 1/20 | 0.42 |
| ▸ | GRIA4 | P48058 | 1/20 | 0.42 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.42 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.42 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.42 |
| ▸ | GRIK3 | Q13003 | 1/20 | 0.42 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL710039 | 1.00 | SLC1A1 (0.42) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL28138215 | 0.98 | SLC1A1 (0.41) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL710038 | 0.88 | SLC1A1 (0.56) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL404449 | 0.86 | SLC1A1 (0.54) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL29094232 | 0.86 | SLC1A1 (0.54) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| Ammonia Solution, Strong SCHEMBL29126346 | 0.86 | SLC1A1 (0.54) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL148075 | 0.86 | SLC1A1 (0.54) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL28989733 | 0.86 | CYP1A2 (0.59) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL4904816 | 0.86 | CYP1A2 (0.59) | SLC1A1GSRSLC1A3SLC1A2GRM8 | |
| SCHEMBL404448 | 0.85 | SLC1A1 (0.39) | SLC1A1GSRSLC1A3SLC1A2GRM8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021261098-A1 | NICKEL COLLOID CATALYST SOLUTION FOR ELECTROLESS NICKEL OR NICKEL ALLOY PLATING USE, ELECTROLESS NICKEL OR NICKEL ALLOY PLATING METHOD, AND METHOD FOR MANUFACTURING NICKEL- OR NICKEL-ALLOY-PLATED SUBSTRATE | 石原ケミカル株式会社 | 2021-12-30 | — | — | WO | claimed |
| CN-117940380-A | Adsorption process for removal of nitrilotriacetic acid (NTA) from EDTA-containing chelating agent solutions | 陶氏环球技术有限责任公司 | 2024-04-26 | — | — | CN | disclosed |
| WO-2022113972-A1 | COORDINATION POLYMER AND COMPOSITION CONTAINING SAME FOR PEST CONTROL | 日本曹達株式会社 | 2022-06-02 | — | — | WO | disclosed |
| WO-2021261098-A1 | NICKEL COLLOID CATALYST SOLUTION FOR ELECTROLESS NICKEL OR NICKEL ALLOY PLATING USE, ELECTROLESS NICKEL OR NICKEL ALLOY PLATING METHOD, AND METHOD FOR MANUFACTURING NICKEL- OR NICKEL-ALLOY-PLATED SUBSTRATE | 石原ケミカル株式会社 | 2021-12-30 | — | — | WO | disclosed |
| EP-3124562-B1 | INK JET TEXTILE PRINTING PENETRANT AND INK JET RECORDING APPARATUS | SEIKO EPSON CORP (JP) | 2021-03-03 | — | — | EP | disclosed |
| US-10385223-B2 | Ink jet textile printing penetrant and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2019-08-20 | — | — | US | disclosed |
| US-20170029636-A1 | INK JET TEXTILE PRINTING PENETRANT AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2017-02-02 | — | — | US | disclosed |
| EP-3124562-A2 | INK JET TEXTILE PRINTING PENETRANT AND INK JET RECORDING APPARATUS | Seiko Epson Corporation (JP) | 2017-02-01 | — | — | EP | disclosed |
| EP-1867667-B1 | Method for manufacturing stabilized polyacetal resin | POLYPLASTICS CO (JP) | 2012-10-31 | — | — | EP | disclosed |
| US-20080271381-A1 | Method for manufacturing stabilized polyacetal resin, stabilized polyacetal resin, stabilized polyacetal resin composition, and molded article of stabilized polyacetal resin | POLYPLASTICS CO., LTD (JP) | 2008-11-06 | — | — | US | disclosed |
| EP-1867667-A1 | Method for manufacturing stabilized polyacetal resin, stabilized polyacetal resin, stabilized polyacetal resin composition, and molded article of stabilized polyacetal resin | Polyplastics Co., Ltd. (JP) | 2007-12-19 | — | — | EP | disclosed |