SCHEMBL4904816

SCHEMBL4904816

N[C@@H](CCC(=O)O)C(=O)OC(C(=O)O)C(=O)O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.59
GRM8 O00222 1/20 0.59
GRM6 O15303 1/20 0.59
GRIN2D O15399 1/20 0.59
GRIN3B O60391 1/20 0.59
GSR P00390 1/20 0.59
GRIK1 P39086 1/20 0.59
GRM5 P41594 1/20 0.59
GRIA1 P42261 1/20 0.59
GRIA2 P42262 1/20 0.59
GRIA3 P42263 1/20 0.59
SLC1A3 P43003 1/20 0.59
SLC1A2 P43004 1/20 0.59
SLC1A1 P43005 1/20 0.59
GRIA4 P48058 1/20 0.59
GRIN1 Q05586 1/20 0.59
GRIN2A Q12879 1/20 0.59
GRIK2 Q13002 1/20 0.59
GRIK3 Q13003 1/20 0.59
GRIN2B Q13224 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28989733 1.00 CYP1A2 (0.59) CYP1A2GRM8GRM6GRIN2DGRIN3B
Ammonia Solution, Strong SCHEMBL29126348 0.98 GRM8 (0.57) CYP1A2GRM8GRM6GRIN2DGRIN3B
SCHEMBL404447 0.98 GRM8 (0.57) CYP1A2GRM8GRM6GRIN2DGRIN3B
SCHEMBL16735412 0.96 GRM8 (0.55) CYP1A2GRM8GRM6GRIN2DGRIN3B
Ammonia Solution, Strong SCHEMBL16735416 0.96 GRM8 (0.55) CYP1A2GRM8GRM6GRIN2DGRIN3B
SCHEMBL4904802 0.86 SLC1A1 (0.42) CYP1A2GRM8GRM6GRIN2DGRIN3B
SCHEMBL710039 0.86 SLC1A1 (0.42) CYP1A2GRM8GRM6GRIN2DGRIN3B
SCHEMBL28138215 0.85 SLC1A1 (0.41) CYP1A2GRM8GRM6GRIN2DGRIN3B
SCHEMBL404450 0.83 CA1 (0.39) CYP1A2GRM8GRM6GRIN2DGRIN3B
SCHEMBL21490308 0.83 CA1 (0.39) CYP1A2GRM8GRM6GRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021261098-A1 NICKEL COLLOID CATALYST SOLUTION FOR ELECTROLESS NICKEL OR NICKEL ALLOY PLATING USE, ELECTROLESS NICKEL OR NICKEL ALLOY PLATING METHOD, AND METHOD FOR MANUFACTURING NICKEL- OR NICKEL-ALLOY-PLATED SUBSTRATE 石原ケミカル株式会社 2021-12-30 WO claimed
CN-117940380-A Adsorption process for removal of nitrilotriacetic acid (NTA) from EDTA-containing chelating agent solutions 陶氏环球技术有限责任公司 2024-04-26 CN disclosed
WO-2022113972-A1 COORDINATION POLYMER AND COMPOSITION CONTAINING SAME FOR PEST CONTROL 日本曹達株式会社 2022-06-02 WO disclosed
WO-2021261098-A1 NICKEL COLLOID CATALYST SOLUTION FOR ELECTROLESS NICKEL OR NICKEL ALLOY PLATING USE, ELECTROLESS NICKEL OR NICKEL ALLOY PLATING METHOD, AND METHOD FOR MANUFACTURING NICKEL- OR NICKEL-ALLOY-PLATED SUBSTRATE 石原ケミカル株式会社 2021-12-30 WO disclosed
EP-3124562-B1 INK JET TEXTILE PRINTING PENETRANT AND INK JET RECORDING APPARATUS SEIKO EPSON CORP (JP) 2021-03-03 EP disclosed
US-10385223-B2 Ink jet textile printing penetrant and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2019-08-20 US disclosed
US-20170029636-A1 INK JET TEXTILE PRINTING PENETRANT AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2017-02-02 US disclosed
EP-3124562-A2 INK JET TEXTILE PRINTING PENETRANT AND INK JET RECORDING APPARATUS Seiko Epson Corporation (JP) 2017-02-01 EP disclosed
EP-1867667-B1 Method for manufacturing stabilized polyacetal resin POLYPLASTICS CO (JP) 2012-10-31 EP disclosed
US-20080271381-A1 Method for manufacturing stabilized polyacetal resin, stabilized polyacetal resin, stabilized polyacetal resin composition, and molded article of stabilized polyacetal resin POLYPLASTICS CO., LTD (JP) 2008-11-06 US disclosed
EP-1867667-A1 Method for manufacturing stabilized polyacetal resin, stabilized polyacetal resin, stabilized polyacetal resin composition, and molded article of stabilized polyacetal resin Polyplastics Co., Ltd. (JP) 2007-12-19 EP disclosed