SCHEMBL491074

SCHEMBL491074

ClC(Cl)(Cl)c1ccc(C=Cc2ncncn2)c(C(Cl)(Cl)Cl)c1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5252251 0.72 TSHR (0.43) TSHR
SCHEMBL607282 0.70 TSHR (0.35) TSHR
SCHEMBL18243190 0.70 TSHR (0.41) TSHR
SCHEMBL11517114 0.70
SCHEMBL3440646 0.70
SCHEMBL7646630 0.66
SCHEMBL9871622 0.66
SCHEMBL18242734 0.66 TSHR (0.38) TSHR
SCHEMBL18242768 0.65 TSHR (0.36) TSHR
SCHEMBL1082436 0.62 TSHR (0.32) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 168 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200282638-A1 METHOD OF MAKING 3D PRINTED OBJECTS USING TWO DISTINCT LIGHT SOURCES PHOTOCENTRIC LIMITED (GB) 2020-09-10 US claimed
US-11597839-B2 Methods for making an object and formulations for use in said methods PHOTOCENTRIC LIMITED (GB) 2023-03-07 US disclosed
EP-3572874-B1 METHODS FOR MAKING A METAL, SAND OR CERAMIC OBJECT BY ADDITIVE MANUFACTURE AND FORMULATIONS FOR USE IN SAID METHODS PHOTOCENTRIC LTD (GB) 2022-01-19 EP disclosed
US-20200282637-A1 METHOD OF MAKING 3D PRINTED OBJECTS BY DISPENSING SEQUENTIAL LAYERS OF MATERIAL PHOTOCENTRIC LIMITED (GB) 2020-09-10 US disclosed
US-20200282638-A1 METHOD OF MAKING 3D PRINTED OBJECTS USING TWO DISTINCT LIGHT SOURCES PHOTOCENTRIC LIMITED (GB) 2020-09-10 US disclosed
EP-3132932-B1 LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS PRESSTEK LLC (US) 2020-04-15 EP disclosed
US-20200079966-A1 METHODS FOR MAKING A METAL, SAND OR CERAMIC OBJECT BY ADDITIVE MANUFACTURE AND FORMULATIONS FOR USE IN SAID METHODS PHOTOCENTRIC LIMITED (GB) 2020-03-12 US disclosed
EP-3541856-A1 METHODS FOR MAKING A METAL, SAND OR CERAMIC OBJECT BY ADDITIVE MANUFACTURE AND FORMULATIONS FOR USE IN SAID METHODS Photocentric Limited (GB) 2019-09-25 EP disclosed
US-20180299779-A1 METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE PHOTOCENTRIC LIMITED (GB) 2018-10-18 US disclosed
US-20180282544-A1 Methods For Making An Object And Formulations For Use In Said Methods PHOTOCENTRIC LIMITED (GB) 2018-10-04 US disclosed
US-20050130064-A1 ANTIHALATION DYE FOR NEGATIVE-WORKING PRINTING PLATES CITICORP NORTH AMERICA, INC., AS AGENT 2005-06-16 US disclosed
US-20040224257-A1 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image FUJI PHOTO FILM CO., LTD. 2004-11-11 US disclosed
WO-2004074930-A2 RADIATION-SENSITIVE COMPOSITIONS COMPRISING OXAZOLE DERIVATIVES AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-09-02 WO disclosed
WO-2004074929-A2 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-09-02 WO disclosed
WO-2004049071-A1 RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-06-10 WO disclosed
WO-2004049069-A1 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES KODAK POLYCHROME GRAPHICS GMBH (DE) 2004-06-10 WO disclosed
US-6664025-B2 Ethylenically unsaturated monomer capable of free radical addition polymerizatio catalysis; binder, photoinitiator and cyanopyidone sensitizer; metallocene and onium coninitiators KODAK POLYCHROME GRAPHICS LLC 2003-12-16 US disclosed
US-20030180635-A1 Visible radiation sensitive composition KODAK (NEAR EAST) INC. 2003-09-25 US disclosed
US-6322950-B1 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative FUJI PHOTO FILM CO., LTD. (JP) 2001-11-27 US disclosed
EP-1035435-A2 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative FUJI PHOTO FILM CO., LTD. (JP) 2000-09-13 EP disclosed