SCHEMBL4910876

SCHEMBL4910876

C=C(C)C(=O)OCCOc1c(F)c(F)c(F)c(F)c1F

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.50
TSHR P16473 4/20 0.44
POLB P06746 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
APEX1 P27695 1/20 0.41
HTT P42858 1/20 0.41
ALDH1A1 P00352 2/20 0.36
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
MTOR P42345 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
MAPT P10636 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1203762 0.98 THRB (0.52) THRBTSHRPOLBTDP1APEX1
SCHEMBL14962520 0.89 THRB (0.40) THRBTSHRPOLBTDP1APEX1
SCHEMBL17800806 0.88 THRB (0.46) THRBTSHRPOLBTDP1APEX1
SCHEMBL21244241 0.80 THRB (0.52) THRBTSHRPOLBTDP1APEX1
SCHEMBL11143904 0.79 THRB (0.50) THRBTSHRPOLBTDP1APEX1
SCHEMBL9719502 0.79 THRB (0.55) THRBTSHRPOLBTDP1APEX1
SCHEMBL15636 0.78 THRB (0.74) THRBTSHRPOLBTDP1APEX1
SCHEMBL6142874 0.78 THRB (0.74) THRBTSHRPOLBTDP1APEX1
SCHEMBL15303251 0.76 THRB (0.47) THRBTSHRPOLBTDP1APEX1
Ethylene SCHEMBL955493 0.76 THRB (0.71) THRBTSHRPOLBTDP1APEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130095429-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-04-18 US disclosed
US-20130095429-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-04-18 US disclosed
US-20080255307-A1 Copolymers comprising low surface tension (meth)acrylates PPG INDUSTRIES OHIO, INC. (US) 2008-10-16 US disclosed
US-20050119409-A1 Copolymers comprising low surface tension (meth) acrylates OLSON KURT G (US) 2005-06-02 US disclosed
US-6841641-B2 Copolymers comprising low surface tension (meth) acrylates PPG INDUSTRIES OHIO, INC. (US) 2005-01-11 US disclosed
US-6586530-B1 controlled radical (co)polymerization process to produce the low surface tension (meth)acrylate containing block copolymers. PPG INDUSTRIES OHIO, INC. 2003-07-01 US disclosed
US-6583223-B2 First block is radically polymerizable fluoroalkyl(meth)acrylate monomer, second block is ethylenically unsaturated monomer that is free of hydroxyl groups and amine groups; thermosetting reactants PPG INDUSTRIES OHIO, INC. 2003-06-24 US disclosed
US-20030114593-A1 Low surface tension (meth) acrylate containing block copolymer prepared by controlled radical polymerization PPG INDUSTRIES OHIO, INC. 2003-06-19 US disclosed
US-20030100675-A1 Coating compositions which contain a low surface tension (meth) acrylate containing block copolymer flow control agent PPG INDUSTRIES OHIO, INC. 2003-05-29 US disclosed
US-20030096929-A1 Copolymers comprising low surface tension (meth) acrylates PPG INDUSTRIES OHIO, INC. 2003-05-22 US disclosed
WO-2003027159-A2 COMPOSITIONS CONTAINING A LOW SURFACE TENSION (METH)ACRYLATE CONTAINING BLOCK COPOLYMER PPG INDUSTRIES OHIO, INC. (US) 2003-04-03 WO disclosed
WO-2003027155-A1 COPOLYMERS COMPRISING LOW SURFACE TENSION (METH)ACRYLATES PPG INDUSTRIES OHIO, INC. (US) 2003-04-03 WO disclosed