SCHEMBL491133

SCHEMBL491133

C=C(C)C(=O)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17436760 0.87 TDP1 (0.40)
Methacrylic Acid SCHEMBL10760313 0.75 TDP1 (0.50)
SCHEMBL2423495 0.75
Methacrylic Acid SCHEMBL6914317 0.75
SCHEMBL29036811 0.74 TDP1 (0.42)
SCHEMBL8470170 0.73
SCHEMBL8835058 0.73
SCHEMBL4695301 0.73
SCHEMBL16063 0.73
SCHEMBL8810584 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 933 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026087474-A1 PROCESS OF PREPARATION OF A FUNCTIONALIZED POLYMER SNF GROUP (FR) 2026-04-30 WO claimed
WO-2026087478-A1 PROCESS OF PREPARATION OF A FUNCTIONALIZED POLYMER SNF GROUP (FR) 2026-04-30 WO claimed
WO-2026087475-A1 PROCESS OF PREPARATION OF A FUNCTIONALIZED POLYMER SNF GROUP (FR) 2026-04-30 WO claimed
EP-4729549-A1 PROCESS OF PREPARATION OF A FUNCTIONALIZED POLYMER SNF Group (FR) 2026-04-22 EP claimed
US-12605926-B2 Binder composition for secondary battery GRST SINGAPORE PTE. LTD. (SG) 2026-04-21 US claimed
EP-4169110-B1 METHOD FOR COMPOSITE DELAMINATION GRST SINGAPORE PTE LTD (SG) 2026-04-15 EP claimed
EP-4169106-B1 METHOD FOR COMPOSITE DELAMINATION GRST SINGAPORE PTE LTD (SG) 2026-04-01 EP claimed
EP-4169108-B1 METHOD FOR COMPOSITE DELAMINATION GRST SINGAPORE PTE LTD (SG) 2025-12-03 EP claimed
US-12431502-B2 Binder composition for secondary battery GRST SINGAPORE PTE. LTD. (SG) 2025-09-30 US claimed
US-12410265-B2 Method for polymer precipitation GRST SINGAPORE PTE. LTD. (SG) 2025-09-09 US claimed
US-20080220350-A1 Hole blocking layer containing photoconductors XEROX CORPORATION 2008-09-11 US claimed
US-20070248813-A1 Imaging member having styrene XEROX CORPORATION (US) 2007-10-25 US claimed
CN-1777568-A Process for manufacture of an allyl ether PERSTORP SPECIALTY CHEM AB (SE) 2006-05-24 CN claimed
CN-1229352-C Herbicidal 2- (5-isoxazolinyl methoxyphenyl) -4, 5, 6, 7-tetrahydro-2H-indazole derivatives KOREA RES INST OF CHEMIAL TECH (US) 2005-11-30 CN claimed
US-6080885-A Process for preparing a phosphonium salt compound having an acryl group NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) 2000-06-27 US claimed
US-5834621-A Novel sulfur-containing compound and method for preparing the same SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 1998-11-10 US claimed
US-5013448-A Acid catalyzed esterification of polyhydroxy alkyl acrylate and polymeric carboxylic acid ALLIED-SIGNAL INC. (US) 1991-05-07 US claimed
US-4555468-A Photosensitive diazonium material with precoat of graft polymer prepared by grafting cellulose derivation with radical polymerizable monomer DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1985-11-26 US claimed
US-4000958-A Method for treating leather SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1977-01-04 US claimed
US-3964955-A Bonding method using olefin-acrylic ester copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-06-22 US claimed