Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | CNR1 | P21554 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | MGAM | O43451 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SI | P14410 | 1/20 | 0.31 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.31 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3225387 | 1.00 | TSHR (0.43) | TSHRKMT2AMEN1LMNAALDH1A1 | |
| SCHEMBL15759062 | 0.93 | TSHR (0.43) | TSHRKMT2AMEN1LMNAALDH1A1 | |
| SCHEMBL15355937 | 0.87 | TSHR (0.41) | TSHRKMT2AMEN1LMNAALDH1A1 | |
| SCHEMBL11648921 | 0.82 | — | — | |
| SCHEMBL11648924 | 0.82 | — | — | |
| SCHEMBL10016885 | 0.82 | DGKA (0.33) | TSHRMAPT | |
| SCHEMBL14649851 | 0.81 | — | — | |
| SCHEMBL14085157 | 0.81 | TSHR (0.36) | TSHRALDH1A1KDM4ERECQLHSD17B10 | |
| SCHEMBL9155844 | 0.81 | — | — | |
| SCHEMBL9155838 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 174 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090142692-A1 | LOW MOLECULAR WEIGHT LATEX AND TONER COMPOSITIONS COMPRISING THE SAME | XEROX CORPORATION (US) | 2009-06-04 | — | — | US | claimed |
| US-20060286476-A1 | manufactured under monomer-starved polymerization condition such as monomer feeding rate equal to or less than 0.516% per minute by weight of the monomer(s) to be fed; gloss, fusing performance, crease performance, stripping performance, document offset, vinyl offset, and parent charging etc. | XEROX CORPORATION | 2006-12-21 | — | — | US | claimed |
| US-5506320-A | A SATURATED POLYMERIC BACKBONE HAVING REACTIVE GROUPS AT EACH END AND AT LEAST ONE PENDANT CHAIN WHICH IS MISCIBLE WITH THE THERMOSETTING RESIN WHILE IT IS UNCURED | THE B. F. GOODRICH COMPANY (US) | 1996-04-09 | — | — | US | claimed |
| EP-3608367-B1 | ROOM-TEMPERATURE-CURABLE ORGANOPOLYSILOXANE COMPOSITION AND BASE MATERIAL | SHINETSU CHEMICAL CO (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-20240153687-A1 | COMPOSITION HAVING MAGNETOSTRICTIVE PROPERTIES, AND CURED PRODUCT THEREOF | TOHOKU UNIVERSITY (JP) | 2024-05-09 | — | — | US | disclosed |
| EP-3594220-B1 | ORGANOSILICON COMPOUND AND METHOD FOR PRODUCING SAME | SHINETSU CHEMICAL CO (JP) | 2024-05-08 | — | — | EP | disclosed |
| EP-4303244-A1 | COMPOSITION HAVING MAGNETOSTRICTIVE PROPERTIES, AND CURED PRODUCT THEREOF | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-10 | — | — | EP | disclosed |
| EP-3783037-B1 | POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR | SHINETSU CHEMICAL CO (JP) | 2024-01-10 | — | — | EP | disclosed |
| WO-2023214526-A1 | ORGANOPOLYSILOXANE CONTAINING MERCAPTO GROUP AND ALKOXYSILYL GROUP, AND COMPOSITION COMPRISING SAME | 信越化学工業株式会社 | 2023-11-09 | — | — | WO | disclosed |
| CN-111989348-B | Polymer having reactive silicon-containing group and method for producing same | 信越化学工业株式会社 | 2023-10-20 | — | — | CN | disclosed |
| CN-111989333-B | Organosilicon compound and method for producing same | 信越化学工业株式会社 | 2023-09-15 | — | — | CN | disclosed |
| US-6607864-B2 | Heating heating member that is in contact with a toner image to fix toner image onto a recording medium, wherein a surface of heating member or vicinity generates heat, and a toner forming the toner image contains a colorant and binder resin | FUJI XEROX CO., LTD. (JP) | 2003-08-19 | — | — | US | disclosed |
| US-20030027073-A1 | Image forming method | FUJI XEROX CO., LTD. (JP) | 2003-02-06 | — | — | US | disclosed |
| US-5506320-A | A SATURATED POLYMERIC BACKBONE HAVING REACTIVE GROUPS AT EACH END AND AT LEAST ONE PENDANT CHAIN WHICH IS MISCIBLE WITH THE THERMOSETTING RESIN WHILE IT IS UNCURED | THE B. F. GOODRICH COMPANY (US) | 1996-04-09 | — | — | US | disclosed |
| EP-0490269-B1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN CO (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-5250629-A | Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts | IDEMITSU KOSAN CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0490269-A1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-06-17 | — | — | EP | disclosed |
| US-4359542-A | PREPARATION OF FOAMS | OLIN CORPORATION (US) | 1982-11-16 | — | — | US | disclosed |
| US-4258148-A | FREE RADICAL INITIATION | OLIN CORPORATION (US) | 1981-03-24 | — | — | US | disclosed |
| US-4094868-A | Azo di-ester polyols for graft copolymerization | OLIN CORPORATION (US) | 1978-06-13 | — | — | US | disclosed |