SCHEMBL491322

SCHEMBL491322

CC(C)(C[NH])N=NC(C)(C)CN

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL29515101 0.84 CYP2D6 (0.41) CYP2D6
Hydrochloric Acid SCHEMBL4890628 0.84 CYP2D6 (0.41) CYP2D6
SCHEMBL15745361 0.72 ALDH1A1 (0.65) CYP2D6
SCHEMBL29175533 0.69
SCHEMBL611032 0.67 CYP2D6 (0.44) CYP2D6
SCHEMBL3777056 0.65
SCHEMBL4249064 0.65
SCHEMBL14565968 0.63
SCHEMBL15800723 0.63
SCHEMBL96283 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 225 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2634198-B1 Copolymers containing phosphorylcholine groups and methods of preparing and using the same SUNTECH CO LTD (KR) 2014-09-17 EP claimed
US-7652128-B2 Toner composition XEROX CORPORATION (US) 2010-01-26 US claimed
US-20090142692-A1 LOW MOLECULAR WEIGHT LATEX AND TONER COMPOSITIONS COMPRISING THE SAME XEROX CORPORATION (US) 2009-06-04 US claimed
US-20060286476-A1 manufactured under monomer-starved polymerization condition such as monomer feeding rate equal to or less than 0.516% per minute by weight of the monomer(s) to be fed; gloss, fusing performance, crease performance, stripping performance, document offset, vinyl offset, and parent charging etc. XEROX CORPORATION 2006-12-21 US claimed
US-20060100300-A1 Toner composition XEROX CORPORATION 2006-05-11 US claimed
JP-11323229-A None JP disclosed
EP-3608367-B1 ROOM-TEMPERATURE-CURABLE ORGANOPOLYSILOXANE COMPOSITION AND BASE MATERIAL SHINETSU CHEMICAL CO (JP) 2024-07-10 EP disclosed
EP-3594220-B1 ORGANOSILICON COMPOUND AND METHOD FOR PRODUCING SAME SHINETSU CHEMICAL CO (JP) 2024-05-08 EP disclosed
EP-3783037-B1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR SHINETSU CHEMICAL CO (JP) 2024-01-10 EP disclosed
US-11827738-B2 Thiol-ene-curing compositions MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) 2023-11-28 US disclosed
CN-116897399-A Composition having magnetostriction properties and cured product thereof 东京应化工业株式会社 2023-10-17 CN disclosed
EP-3348623-B1 PRESSURE-SENSITIVE ADHESIVE COMPOSITION, PROCESS FOR PRODUCING SAME, AND PRESSURE-SENSITIVE ADHESIVE FILM MITSUI CHEMICALS TOHCELLO INC (JP) 2023-10-11 EP disclosed
US-5541259-A N-ALKYL-SUBSTITUTED MALEIMIDE-OLEFIN COPOLYMER, ELASTOMER, POLYESTER TOSOH CORPORATION (JP) 1996-07-30 US disclosed
US-5512634-A Resin composition TOSOH CORPORATION (JP) 1996-04-30 US disclosed
EP-0490269-B1 Graft copolymer and process for producing the same IDEMITSU KOSAN CO (JP) 1996-02-28 EP disclosed
US-5424380-A N-alkyl-substituted maleimide/olefin copolymer and a modified resin; heat resistance; rigidity; izod impact strength; weather resistance; dimensional resistance TOSOH CORPORATION (JP) 1995-06-13 US disclosed
US-5250629-A Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts IDEMITSU KOSAN CO., LTD. (JP) 1993-10-05 US disclosed
EP-0490269-A1 Graft copolymer and process for producing the same IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-06-17 EP disclosed
EP-0062373-B1 POLYMER CONCRETE COMPOSITIONS AND THEIR USE IN PREPARING ARTICLES SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1986-09-10 EP disclosed
EP-0062373-A1 Polymer concrete compositions and their use in preparing articles SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1982-10-13 EP disclosed