SCHEMBL49160

SCHEMBL49160

CN1CCOCC1.OB(O)Oc1cccc2ccc3cc4ccccc4cc3c12

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKDC P78527 2/20 0.36
ALDH1A1 P00352 4/20 0.35
KDM4E B2RXH2 3/20 0.35
HTT P42858 2/20 0.35
LMNA P02545 1/20 0.35
TP53 P04637 1/20 0.35
MAPT P10636 1/20 0.35
ALOX15 P16050 1/20 0.35
ALOX12 P18054 1/20 0.35
MCL1 Q07820 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
HSD17B10 Q99714 1/20 0.35
CYP1A2 P05177 1/20 0.34
CYP2C19 P33261 1/20 0.34
PIK3CD O00329 1/20 0.33
XRCC6 P12956 1/20 0.33
XRCC5 P13010 1/20 0.33
APAF1 O14727 1/20 0.33
CDC25B P30305 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10897712 0.88 KDM4E (0.39) ALDH1A1KDM4ELMNAMAPTSMN1; SMN2
SCHEMBL19259375 0.83 CYP1A2 (0.41) ALDH1A1KDM4ETP53MAPTSMN1; SMN2
Morpholine SCHEMBL11515192 0.83 APEX1 (0.32) CYP1A2
SCHEMBL73568 0.82 CYP1A2 (0.40) ALDH1A1KDM4ETP53MAPTSMN1; SMN2
SCHEMBL1314570 0.82 CYP1A2 (0.40) ALDH1A1KDM4ETP53MAPTSMN1; SMN2
SCHEMBL911163 0.82 CYP1A2 (0.40) ALDH1A1KDM4ETP53MAPTSMN1; SMN2
Ammonia Solution, Strong SCHEMBL1035827 0.82 CYP1A2 (0.40) ALDH1A1KDM4ETP53MAPTSMN1; SMN2
Phosphine SCHEMBL3288817 0.82 CYP1A2 (0.40) ALDH1A1KDM4ETP53MAPTSMN1; SMN2
SCHEMBL445634 0.82 CYP1A2 (0.40) ALDH1A1KDM4ETP53MAPTSMN1; SMN2
Hydrogen Sulfide SCHEMBL17372873 0.82 CYP1A2 (0.40) ALDH1A1KDM4ETP53MAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119072454-A Zeolite, method for producing zeolite, composition, liquid sealing agent, resin composite material, sealing material, method for producing sealing material, and electronic device 三菱化学株式会社 2024-12-03 CN disclosed
CN-118510843-A Liquid sealing resin composition and semiconductor device 松下知识产权经营株式会社 2024-08-16 CN disclosed
CN-113185807-B Resin composition for underfill, electronic component device, and method for manufacturing electronic component device 株式会社力森诺科 2024-03-29 CN disclosed
CN-113195582-A Resin composition for sealing and electronic component device 昭和电工材料株式会社 2021-07-30 CN disclosed
EP-2557121-B1 RESIN COMPOSITION, PREPREG AND LAMINATE MITSUBISHI GAS CHEMICAL CO (JP) 2020-03-04 EP disclosed
CN-105418970-B Inorganic filler and composition epoxy resin comprising the inorganic filler LG伊诺特有限公司 2019-10-18 CN disclosed
CN-106024654-B Semiconductor device 日立化成株式会社 2019-07-02 CN disclosed
EP-2662395-B1 Epoxy resin, epoxy resin compound comprising the same, and radiant heat circuit board using the compound LG INNOTEK CO LTD (KR) 2019-06-26 EP disclosed
CN-105461921-B Polyimide resin composition, adhesive compound, paint base composition, laminated body and the copper foil with resin 荒川化学工业株式会社 2019-05-10 CN disclosed
CN-105874028-B Printing distributing board adhesive composite, plywood and flexible printing patch panel 荒川化学工业株式会社 2019-04-26 CN disclosed
EP-1273608-A1 FLAME-RETARDANT EPOXY RESIN COMPOSITION, MOLDED OBJECT THEREOF, AND ELECTRONIC PART OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 2003-01-08 EP disclosed
US-6495270-B1 ADDITION PRODUCT OF A HETEROCYCLIC AMIDINE AND A QUINONE IS ACCELERATOR; ENCAPSULATION OF ELECTRONIC COMPONENT PARTS; RAPID CURABILITY, CURABILITY AFTER MOISTURE ABSORPTION UNDER MOIST CONDITION, POT LIFE AND FLOW PROPERTIES HITACHI CHEMICAL COMPANY, LTD. (JP) 2002-12-17 US disclosed
CN-1383446-A Resin compsn. for electric and electronic appliances KYOWA CHEM IND CO LTD (JP) 2002-12-04 CN disclosed
EP-1114834-B1 EPOXY RESIN COMPOSITION AND PROCESS FOR PRODUCING SILANE-MODIFIED EPOXY RESIN ARAKAWA CHEM IND (JP) 2002-10-16 EP disclosed
US-6441106-B1 CURING AGENT FOR EPOXY RESIN COMPRISING A SILOXANE-MODIFIED PHENOLIC RESIN OBTAINED BY DEALCOHOLIZATION CONDENSATION BETWEEN A PHENOLIC RESIN AND A HYDROLYZABLE ALKOXYSILANE SUCH AS A POLYSILICATE ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2002-08-27 US disclosed
CN-1318077-A Partial condensate of alkoxysilane containing glycidyl ether group, silane-modified resin, composition thereof and process for producing the same ARAKAWA CHEM IND (JP) 2001-10-17 CN disclosed
EP-1123944-A1 GLYCIDYL ETHER GROUP-CONTAINING PARTIAL ALKOXYSILANE CONDENSATE, SILANE-MODIFIED RESIN, COMPOSITIONS OF THESE, AND PROCESSES FOR PRODUCING THESE ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2001-08-16 EP disclosed
EP-1114834-A1 EPOXY RESIN COMPOSITION AND PROCESS FOR PRODUCING SILANE-MODIFIED EPOXY RESIN Arakawa Chemical Industries, Ltd. (JP) 2001-07-11 EP disclosed
EP-1086972-A1 HARDENER FOR EPOXY RESIN, EPOXY RESIN COMPOSITION, AND PROCESS FOR PRODUCING SILANE-MODIFIED PHENOLIC RESIN Arakawa Chemical Industries, Ltd. (JP) 2001-03-28 EP disclosed
EP-1057817-A1 NOVEL COMPOUNDS, HARDENING ACCELERATOR, RESIN COMPOSITION, AND ELECTRONIC PART DEVICE HITACHI CHEMICAL COMPANY, LTD. (JP) 2000-12-06 EP disclosed