SCHEMBL492152

SCHEMBL492152

O=CCC1OCC2(CO1)COC(CC=O)OC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9063785 0.81
SCHEMBL10453268 0.76
SCHEMBL1469789 0.75 TDP1 (0.32)
SCHEMBL11351354 0.72
SCHEMBL9849296 0.72
SCHEMBL443178 0.65 MEN1 (0.31)
SCHEMBL13973799 0.63
SCHEMBL1470264 0.62 ALDH1A1 (0.31)
SCHEMBL713642 0.62
SCHEMBL536203 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160333215-A1 ACTIVATING ENERGY BEAM-CURABLE COMPOSITION FOR FLOORING MATERIAL DIC CORPORATION (JP) 2016-11-17 US disclosed
US-8399541-B2 Active energy ray-curable ink composition and printed matter DIC CORPORATION (JP) 2013-03-19 US disclosed
US-8104884-B2 Coating agent for UV curable inkjet printing MIMAKI ENGINEERING CO., LTD. (JP) 2012-01-31 US disclosed
US-20110221839-A1 COATING AGENT FOR UV CURABLE INKJET PRINTING MIMAKI ENGINEERING CO., LTD. (JP) 2011-09-15 US disclosed
EP-2064067-B1 INK JET RECORDING METHOD RICOH CO LTD (JP) 2011-06-08 EP disclosed
US-7938527-B2 Ink, ink cartridge, ink jet recording apparatus, and ink jet recording method RICOH COMPANY, LTD. (JP) 2011-05-10 US disclosed
US-20110014438-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION AND PRINTED MATTER DIC CORPORATION (JP) 2011-01-20 US disclosed
EP-2258778-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION AND PRINTED MATTER DIC Corporation (JP) 2010-12-08 EP disclosed
US-20100265292-A1 INK, INK CARTRIDGE, INK JET RECORDING APPARATUS, AND INK JET RECORDING METHOD RICOH COMPANY, LTD. (JP) 2010-10-21 US disclosed
US-7649027-B2 having juts via photopolymerization in supercritical carbon dioxide; calcining KANSAI PAINT CO., LTD. (JP) 2010-01-19 US disclosed
US-7232857-B2 Radiation hardenable adhesive composition containing dispersed natural rubber fine particles TOPPAN FORMS CO., LTD. (JP) 2007-06-19 US disclosed
EP-1698647-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2006-09-06 EP disclosed
EP-1398360-B1 RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES TOPPAN FORMS CO LTD (JP) 2006-08-16 EP disclosed
US-7081486-B2 Method of producing polymer SHIZUOKA UNIVERSITY (JP) 2006-07-25 US disclosed
EP-1598374-A1 METHOD OF PRODUCING POLYMER Japan as represented by President of Shizuoka University (JP) 2005-11-23 EP disclosed
US-20050143481-A1 Method of producing polymer KANSAI PAINT CO., LTD. (JP) 2005-06-30 US disclosed
US-20050080181-A1 Radiation hardenable adhesive composition containing dispersed natural rubber fine particles TOPPAN FORMS CO., LTD. (JP) 2005-04-14 US disclosed
EP-1398360-A1 RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES Toppan Forms Co., Ltd (JP) 2004-03-17 EP disclosed
EP-0427950-B1 A photosensitive resin composition for use in forming a relief structure ASAHI CHEMICAL IND (JP) 1996-07-17 EP disclosed
US-5336585-A Free of tunnel voids ASAHI KASEI KOGYO KABUSHIKI (JP) 1994-08-09 US disclosed