SCHEMBL4933295

SCHEMBL4933295

CCCCC(O)NCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22215000 1.00
SCHEMBL9801692 0.92 MAPT (0.42)
SCHEMBL9801675 0.90 GPR84 (0.45)
SCHEMBL9801704 0.90 GPR84 (0.45)
SCHEMBL9801305 0.90 GPR84 (0.45)
SCHEMBL9801199 0.90 GPR84 (0.45)
SCHEMBL9801469 0.90 GPR84 (0.45)
SCHEMBL9801579 0.90 GPR84 (0.45)
SCHEMBL9801069 0.90 GPR84 (0.45)
SCHEMBL9801700 0.90 GPR84 (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US claimed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
CN-101143982-A Ink composition for inkjet recording SAMSUNG ELECTRONICS CO LTD (KR) 2008-03-19 CN claimed
EP-0122151-B1 PRODUCTION OF PRIMARY OR SECONDARY ALCOHOL DERIVATIVES OF PHOSPHOLIPIDS BY THE ENZYMATIC TECHNIQUE MEITO SANGYO KABUSHIKI KAISHA (JP) 1989-02-15 EP claimed
WO-2024043115-A1 AMORPHOUS SILICA PARTICLE DISPERSION AND METHOD FOR PRODUCING SAME 学校法人早稲田大学 2024-02-29 WO disclosed
CN-113088703-A Method for producing tungsten carbide 捷客斯金属株式会社 2021-07-09 CN disclosed
EP-3279174-B1 TUNGSTEN CARBIDE PRODUCTION METHOD JX NIPPON MINING & METALS CORP (JP) 2019-12-18 EP disclosed
US-10227235-B2 Method for producing tungsten carbide JX NIPPON MINING & METALS CORPORATION (JP) 2019-03-12 US disclosed
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US disclosed
WO-2018054721-A1 PYRIDINE COMPOUNDS FOR CONTROLLING PHYTOPATHOGENIC HARMFUL FUNGI BASF SE (DE) 2018-03-29 WO disclosed
US-20180072576-A1 METHOD FOR PRODUCING TUNGSTEN CARBIDE JX NIPPON MINING & METALS CORPORATION (JP) 2018-03-15 US disclosed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US disclosed
US-20150057270-A1 CYCLIC PRODRUGS OF DUOCARMYCIN ANALOGS NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2015-02-26 US disclosed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US disclosed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP disclosed
CN-101143982-A Ink composition for inkjet recording SAMSUNG ELECTRONICS CO LTD (KR) 2008-03-19 CN disclosed
CN-101078878-A Colored photosensitive resin composition, color filter, image sensor, and camera system SUMITOMO CHEMICAL CO (JP) 2007-11-28 CN disclosed
CN-101078877-A Colored photosensitive resin composition, color filter, image sensor, and camera system SUMITOMO CHEMICAL CO (JP) 2007-11-28 CN disclosed
US-4992150-A Telomer with alpha-olefin;oil and fuel additive NIPPON OIL CO, LTD. (JP) 1991-02-12 US disclosed