⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3779556 | 0.67 | — | — | |
| Iodide SCHEMBL22027429 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL1452733 | 0.63 | — | — | |
| Bromide SCHEMBL22027449 | 0.63 | — | — | |
| SCHEMBL5615167 | 0.60 | — | — | |
| SCHEMBL85727 | 0.59 | — | — | |
| SCHEMBL152107 | 0.59 | — | — | |
| SCHEMBL3300416 | 0.59 | — | — | |
| Iodide SCHEMBL25276934 | 0.56 | — | — | |
| SCHEMBL2971447 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080160204-A1 | Spontaneous copper seed deposition process for metal interconnects | LAVOIE ADRIEN R | 2008-07-03 | — | — | US | claimed |
| US-5861468-A | Curable siloxane polymer composition and method of curing | DOW CORNING ASIA, LTD. (JP) | 1999-01-19 | — | — | US | disclosed |
| EP-0714952-A1 | Curable siloxane polymer composition and method of curing | DOW CORNING ASIA, Ltd. (JP) | 1996-06-05 | — | — | EP | disclosed |