SCHEMBL493767

SCHEMBL493767

O=S(=O)([SiH3])[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21833398 0.72
SCHEMBL734104 0.72
SCHEMBL1553432 0.72
SCHEMBL17263819 0.72
SCHEMBL13822807 0.65
SCHEMBL9456331 0.65
SCHEMBL1628189 0.55
Sulfuric Acid SCHEMBL110268 0.50 CA5A (1.00)
SCHEMBL419051 0.50
Sulfuric Acid SCHEMBL3699224 0.50 CA5A (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111500799-B Alkali leather high-pH value silica gel precursor sol-gel chromium-free ecological silane tanning process 成都市温江区明尼达硅氟皮化应用研究试验厂 2021-12-28 CN claimed
CN-109097507-B Silane tanning technology for water-soluble polyamine silane coupling agent substituted enzyme preparation 成都凯特有机硅新材料科技有限公司 2021-07-27 CN claimed
CN-109097506-B Manufacturing process of silane tanned leather by combining chromium-free ecological silica gel-tannin extract to tanned vegetable tanned leather 成都凯特有机硅新材料科技有限公司 2021-07-27 CN claimed
CN-111500799-A Alkali leather high-pH value silica gel precursor sol-gel chromium-free ecological silane tanning process 成都市温江区明尼达硅氟皮化应用研究试验厂 2020-08-07 CN claimed
CN-109097506-A A kind of silane tanning manufacturing process of Chrome-free ecotype silica gel-tannin extract Combined tanning vegetable tanning skin 成都凯特有机硅新材料科技有限公司 2018-12-28 CN claimed
CN-109097507-A A kind of water-soluble polyamines base silane coupling agent replaces the silane tanning process of enzyme preparation 成都凯特有机硅新材料科技有限公司 2018-12-28 CN claimed
EP-2107423-B1 Titanocene containing photoconductors XEROX CORP (US) 2013-05-29 EP claimed
EP-2107423-A1 Titanocene containing photoconductors Xerox Corporation (US) 2009-10-07 EP claimed
US-20240201178-A1 DETECTION ASSAY RANDOX LABORATORIES LTD (GB) 2024-06-20 US disclosed
EP-4314821-A1 CORONAVIRUS ASSAY Randox Laboratories Ltd. (GB) 2024-02-07 EP disclosed
EP-4314822-A1 DETECTION ASSAY Randox Laboratories Ltd. (GB) 2024-02-07 EP disclosed
CN-220329145-U Sealant bubble simulation mould and simulation equipment 广东时利和汽车实业集团有限公司 2024-01-12 CN disclosed
WO-2022207863-A1 CORONAVIRUS ASSAY RANDOX LABORATORIES LTD (GB) 2022-10-06 WO disclosed
WO-2022207873-A1 DETECTION ASSAY RANDOX LABORATORIES LTD (GB) 2022-10-06 WO disclosed
US-5079131-A Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations SHIPLEY COMPANY INC. (US) 1992-01-07 US disclosed
EP-0264499-B1 SULFONATED POLY(ARYL ETHER) RESINS AND INTERMEDIATE SILYL SULFONATE DERIVATIVES; METHODS OF MAKING THEM, AND MEMBRANES FORMED FROM THE RESINS AMOCO CORPORATION (an Indiana corp.) (US) 1990-08-01 EP disclosed
US-4921778-A Photoresist pattern fabrication employing chemically amplified metalized material SHIPLEY COMPANY INC. (US) 1990-05-01 US disclosed
EP-0352739-A2 Photoresist pattern fabrication employing chemically amplified metalized material SHIPLEY COMPANY INC. (US) 1990-01-31 EP disclosed
EP-0264499-A1 Sulfonated poly(aryl ether) resins and intermediate silyl sulfonate derivatives; methods of making them, and membranes formed from the resins AMOCO CORPORATION (an Indiana corp.) (US) 1988-04-27 EP disclosed
US-4613398-A Formation of etch-resistant resists through preferential permeation INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1986-09-23 US disclosed