Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8593969 | 1.00 | TP53 (0.32) | TP53TSHRTDP1ALDH1A1 | |
| SCHEMBL9336392 | 0.83 | TP53 (0.32) | TP53TSHRTDP1 | |
| SCHEMBL9336380 | 0.83 | TP53 (0.32) | TP53TSHRTDP1 | |
| SCHEMBL8370840 | 0.80 | CNR1 (0.35) | — | |
| SCHEMBL445324 | 0.79 | CD81 (0.33) | ALDH1A1 | |
| SCHEMBL596364 | 0.79 | CD81 (0.33) | ALDH1A1 | |
| SCHEMBL1155612 | 0.78 | CD81 (0.34) | ALDH1A1 | |
| SCHEMBL4939027 | 0.78 | GRIK1 (0.32) | ALDH1A1 | |
| SCHEMBL9336354 | 0.78 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL9336358 | 0.78 | ALDH1A1 (0.30) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9159356-B2 | Non-resonant two-photon absorption recording material, non-resonant polymer two-photon absorption optical information recording medium, and recording/reproducing method | FUJIFILM CORPORATION (JP) | 2015-10-13 | — | — | US | disclosed |
| US-8609753-B2 | Acrylic rubber composition and cross-linked rubber product | ZEON CORPORATION (JP) | 2013-12-17 | — | — | US | disclosed |
| US-20120302674-A1 | ACRYLIC RUBBER COMPOSITION AND CROSS-LINKED RUBBER PRODUCT | ZEON CORPORATION (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20080071014-A1 | Acrylic Rubber Composition And Acrylic Rubber Vulcanizate | ZEON CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| US-20070160935-A1 | Lithographic printing plate material for CTP | NIPPON PAINT CO., LTD. (JP) | 2007-07-12 | — | — | US | disclosed |
| EP-1790689-A1 | ACRYLIC RUBBER COMPOSITION AND ACRYLIC RUBBER CROSSLINKED PRODUCT | ZEON CORPORATION (JP) | 2007-05-30 | — | — | EP | disclosed |
| US-7097957-B2 | Photosensitive resin laminate | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2006-08-29 | — | — | US | disclosed |
| US-7070906-B2 | Multilayer; support, photosensitive resin layer, infrared radiation ablation layer containing absorption metal | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2006-07-04 | — | — | US | disclosed |
| US-20050238996-A1 | Photosensitive resin laminate | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-1306725-B1 | Photosensitive resin laminate | TOYO BOSEKI (JP) | 2005-07-13 | — | — | EP | disclosed |
| US-20040197706-A1 | Photosensitive resin laminate | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1457818-A2 | Photosensitive resin laminate | Toyo Boseki Kabushiki Kaisha (JP) | 2004-09-15 | — | — | EP | disclosed |
| EP-1306725-A1 | Photosensitive resin laminate | Toyo Boseki Kabushiki Kaisha (JP) | 2003-05-02 | — | — | EP | disclosed |
| US-20030082482-A1 | Photosensitive resin laminate | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2003-05-01 | — | — | US | disclosed |
| EP-0897136-A1 | DEVELOPING SOLUTION FOR PHOTOSENSITIVE RESIN PLATE | Toyo Boseki Kabushiki Kaisha (JP) | 1999-02-17 | — | — | EP | disclosed |
| US-5401608-A | Hydroxy-styrene and melamine derivative polymers | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-03-28 | — | — | US | disclosed |
| EP-0232972-B1 | NEGATIVE PHOTORESIST COMPOSITIONS AND PROCESSES FOR PREPARING THERMALLY STABLE, NEGATIVE IMAGES USING THEM | ROHM AND HAAS COMPANY (US) | 1993-09-08 | — | — | EP | disclosed |
| US-5204225-A | Depositing actinic radiation sensitive aminoplast and phenoplast containing resin on substrate, baking, exposing to actinic radiation, developing | ROHM AND HAAS COMPANY (US) | 1993-04-20 | — | — | US | disclosed |
| US-5034304-A | Halogenated compositions for negative images | ROHM AND HAAS COMPANY (US) | 1991-07-23 | — | — | US | disclosed |
| EP-0232972-A2 | Negative photoresist compositions and processes for preparing thermally stable, negative images using them | ROHM AND HAAS COMPANY (US) | 1987-08-19 | — | — | EP | disclosed |