Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 8/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 6/20 | 0.38 |
| ▸ | PER2 | O15055 | 1/20 | 0.37 |
| ▸ | CRY1 | Q16526 | 1/20 | 0.37 |
| ▸ | CRY2 | Q49AN0 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | XBP1 | P17861 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | PPM1B | O75688 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL92234 | 0.85 | ALDH1A1 (0.49) | SLC6A3SLC6A4PER2CRY1CRY2 | |
| Styrene SCHEMBL10914482 | 0.77 | ALDH1A1 (0.66) | ALDH1A1 | |
| Styrene SCHEMBL35557 | 0.77 | ALDH1A1 (0.66) | ALDH1A1 | |
| Styrene SCHEMBL8536901 | 0.77 | ALDH1A1 (0.66) | ALDH1A1 | |
| SCHEMBL1469984 | 0.76 | ALDH1A1 (0.50) | SLC6A3SLC6A4ALDH1A1 | |
| Styrene SCHEMBL7558323 | 0.76 | ALDH1A1 (0.64) | ALDH1A1 | |
| Styrene SCHEMBL19970470 | 0.75 | ALDH1A1 (0.62) | ALDH1A1 | |
| Styrene SCHEMBL27741754 | 0.75 | ALDH1A1 (0.62) | ALDH1A1 | |
| Styrene SCHEMBL28389326 | 0.75 | ALDH1A1 (0.62) | ALDH1A1 | |
| Styrene SCHEMBL29253162 | 0.75 | ALDH1A1 (0.62) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |