SCHEMBL4941709

SCHEMBL4941709

C[Si](C)(C)O[Si](C)(C)CCN1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 5/20 0.39
CARM1 Q86X55 1/20 0.35
PRMT6 Q96LA8 1/20 0.35
PRMT8 Q9NR22 1/20 0.35
CYP1A2 P05177 2/20 0.33
ALDH1A1 P00352 1/20 0.33
POLB P06746 1/20 0.33
MAPT P10636 1/20 0.33
CYP3A4 P08684 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA9 Q16790 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
KCNH2 Q12809 1/20 0.32
NPC1 O15118 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8100830 0.88 HRH3 (0.46) HRH3CYP1A2CYP3A4KCNH2
SCHEMBL4455120 0.83 HRH3 (0.39) HRH3CARM1PRMT6PRMT8CYP1A2
SCHEMBL4942828 0.78 HRH3 (0.32) HRH3KCNH2
SCHEMBL29496667 0.76 HRH3 (0.46) HRH3CYP1A2CYP3A4KCNH2
SCHEMBL434480 0.75 HRH3 (0.48) HRH3CARM1PRMT6PRMT8CYP1A2
SCHEMBL8833073 0.74 HRH3 (0.42) HRH3CARM1PRMT6PRMT8CYP1A2
SCHEMBL4934531 0.73 HRH3 (0.43) HRH3CARM1PRMT6PRMT8CYP1A2
SCHEMBL1230445 0.72 HRH3 (0.41) HRH3CARM1PRMT6PRMT8CYP1A2
SCHEMBL2501222 0.71 HRH3 (0.39) HRH3CARM1PRMT6PRMT8CYP1A2
SCHEMBL15489982 0.71 CXCR4 (0.49) HRH3CYP1A2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080075981-A1 Magnetic recording medium HITACHI MAXELL, LTD. (JP) 2008-03-27 US disclosed
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed