⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29743199 | 0.83 | — | — | |
| SCHEMBL3919513 | 0.82 | — | — | |
| SCHEMBL21066245 | 0.82 | — | — | |
| SCHEMBL2332482 | 0.80 | — | — | |
| SCHEMBL15402899 | 0.73 | — | — | |
| SCHEMBL9109030 | 0.71 | — | — | |
| SCHEMBL28870195 | 0.71 | — | — | |
| SCHEMBL1921637 | 0.69 | — | — | |
| SCHEMBL45067 | 0.69 | — | — | |
| SCHEMBL863651 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7419707-B2 | Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2008-09-02 | — | — | US | disclosed |
| US-20070172646-A1 | Liquid resin composition, cured film and laminate | JSR CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1491562-B1 | FLUORINATED OLEFIN POLYMER, CURABLE RESIN COMPOSITION, AND ANTIREFLECTION FILM | JSR CORP (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-20060188664-A1 | Coating composition for the formation of low refractive index layer, antireflection film, polarizing plate and liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-24 | — | — | US | disclosed |
| EP-1624022-A1 | LIQUID RESIN COMPOSITION, CURED FILM AND LAMINATE | JSR Corporation (JP) | 2006-02-08 | — | — | EP | disclosed |
| US-6832949-B2 | Window member for chemical mechanical polishing and polishing pad | JSR CORPORATION (JP) | 2004-12-21 | — | — | US | disclosed |
| US-20030129931-A1 | Window member for chemical mechanical polishing and polishing pad | JSR CORPORATION (JP) | 2003-07-10 | — | — | US | disclosed |
| EP-1306163-A1 | Window member for chemical mechanical polishing and polishing pad | JSR Corporation (JP) | 2003-05-02 | — | — | EP | disclosed |
| EP-0953584-B1 | Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating | JSR CORP (JP) | 2002-12-18 | — | — | EP | disclosed |
| US-6271326-B1 | ETHYLENE-TETRAFLUOROETHYLENE-STYRENE POLYMERS AND VINYL ACETATE OR ACRYLIC ACID POLYMERS | JSR CORPORATION (JP) | 2001-08-07 | — | — | US | disclosed |
| EP-0953584-A1 | Olefin polymer, process for manufacturing the same, curable resin composition, and antireflection coating | JSR Corporation (JP) | 1999-11-03 | — | — | EP | disclosed |