SCHEMBL4944654

SCHEMBL4944654

O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F.c1ccc(P(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.60
TDP1 Q9NUW8 1/20 0.60
ESR1 P03372 2/20 0.52
ESR2 Q92731 2/20 0.52
CA2 P00918 1/20 0.44
CA4 P22748 1/20 0.44
CA5A P35218 1/20 0.44
PTPN1 P18031 1/20 0.43
SRC P12931 2/20 0.39
CFTR P13569 1/20 0.39
PTPN5 P54829 1/20 0.38
TSHR P16473 2/20 0.37
ALOX15 P16050 1/20 0.37
KDM4E B2RXH2 1/20 0.37
GAA P10253 1/20 0.37
PGK1 P00558 2/20 0.36
PGK2 P07205 2/20 0.36
CA12 O43570 1/20 0.35
CA9 Q16790 1/20 0.35
MEN1 O00255 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10524459 1.00 CYP3A4 (0.60) CYP3A4TDP1ESR1ESR2CA2
Phosphoric Acid SCHEMBL28562829 0.90 CYP3A4 (0.67) CYP3A4TDP1ESR1ESR2CA2
Phosphoric Acid SCHEMBL1924515 0.90 CYP3A4 (0.67) CYP3A4TDP1ESR1ESR2CA2
Phosphoric Acid SCHEMBL8729178 0.90 CYP3A4 (0.67) CYP3A4TDP1ESR1ESR2CA2
Phosphoric Acid SCHEMBL1924514 0.90 CYP3A4 (0.67) CYP3A4TDP1ESR1ESR2CA2
Phosphoric Acid SCHEMBL8729168 0.90 CYP3A4 (0.67) CYP3A4TDP1ESR1ESR2CA2
Foscarnet SCHEMBL15511197 0.83 CYP3A4 (0.57) CYP3A4TDP1ESR1ESR2CA2
Hydrogen Peroxide SCHEMBL28327016 0.81 TDP1 (0.92) CYP3A4TDP1ESR1ESR2CA2
SCHEMBL3119745 0.79 CA2 (0.62) CYP3A4TDP1ESR1ESR2CA2
SCHEMBL10910453 0.79 TDP1 (0.67) CYP3A4TDP1ESR1ESR2CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4375750-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE ADEKA CORPORATION (JP) 2024-05-29 EP disclosed
WO-2023002928-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE 株式会社ADEKA 2023-01-26 WO disclosed
WO-2021039799-A1 CURABLE COMPOSITION 株式会社日本触媒 2021-03-04 WO disclosed
US-7381350-B2 Fluorene derivatives and polymers thereof CHISSO CORPORATION (JP) 2008-06-03 US disclosed
US-7268196-B2 Process for producing cycloolefin addition polymer JSR CORPORATION (JP) 2007-09-11 US disclosed
US-7241847-B2 Process for producing cycloolefin addition polymer JSR CORPORATION (JP) 2007-07-10 US disclosed
US-20070123667-A1 PROCESS FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER JSR CORPORATION (JP) 2007-05-31 US disclosed
US-20060217505-A1 Process for producing cycloolefin addition polymer JRS CORPORATION (JP) 2006-09-28 US disclosed
EP-1657259-A1 PROCESS FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER JSR Corporation (JP) 2006-05-17 EP disclosed
US-20060006364-A1 Fluorene derivatives and polymers thereof CHISSO CORPORATION AND CHISSO PETROCHEMICAL CORPORATION 2006-01-12 US disclosed