SCHEMBL4949707

SCHEMBL4949707

CCN(C(N)=S)c1cccc2ccccc12

nearest known ligand 0.62

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 11/20 0.62
L3MBTL1 Q9Y468 1/20 0.61
ALDH1A1 P00352 6/20 0.58
KMT2A Q03164 2/20 0.58
LMNA P02545 3/20 0.53
KDM4E B2RXH2 2/20 0.53
MAPT P10636 2/20 0.53
TSHR P16473 2/20 0.46
NPSR1 Q6W5P4 1/20 0.44
CYP1A2 P05177 1/20 0.40
CYP2D6 P10635 1/20 0.40
MEN1 O00255 1/20 0.40
HPGD P15428 1/20 0.40
HTT P42858 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29469736 1.00 SIGMAR1 (0.62) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL8392327 0.87 SIGMAR1 (0.52) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL27515197 0.83 SIGMAR1 (0.62) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL6717237 0.81 SIGMAR1 (0.81) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL28384717 0.78 SIGMAR1 (0.58) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL1567112 0.78 SIGMAR1 (0.62) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL3255855 0.78 SIGMAR1 (0.62) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL3807502 0.78 SIGMAR1 (0.62) SIGMAR1L3MBTL1ALDH1A1KMT2ALMNA
SCHEMBL27559476 0.77 SIGMAR1 (0.65) SIGMAR1L3MBTL1ALDH1A1KMT2A
SCHEMBL6719529 0.77 SIGMAR1 (1.00) SIGMAR1L3MBTL1KMT2ALMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107250076-B Inhibitor composition for hangers when using chromium-free etchants in plastic plating processes 麦克德米德乐思公司 2021-06-29 CN disclosed
EP-3059277-B1 INHIBITOR COMPOSITION FOR RACKS WHEN USING CHROME FREE ETCHES IN A PLATING ON PLASTICS PROCESS MACDERMID ENTHONE INC (US) 2019-04-10 EP disclosed
CN-105755480-B Efficient acidic cleaner 江苏筑磊电子科技有限公司 2018-06-19 CN disclosed
US-20180044813-A1 Inhibitor Composition for Racks When Using Chrome Free Etches in a Plating on Plastics Process CITIBANK, N.A. 2018-02-15 US disclosed
CN-107250076-A Inhibitor combination during Chrome-free etchant for hanger is used in plastics coating method 麦克德米德乐思公司 2017-10-13 CN disclosed
EP-3059277-A1 INHIBITOR COMPOSITION FOR RACKS WHEN USING CHROME FREE ETCHES IN A PLATING ON PLASTICS PROCESS ENTHONE, INCORPORATED (US) 2016-08-24 EP disclosed
CN-105755480-A Efficient acidic cleaner 江苏筑磊电子科技有限公司 2016-07-13 CN disclosed
US-20150345039-A1 COMPOSITION HAVING ALKALINE PH AND PROCESS FOR FORMING SUPERCONFORMATION THEREWITH GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE, THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY 2015-12-03 US disclosed
EP-1649083-B1 AQUEOUS ACIDIC IMMERSION PLATING SOLUTIONS AND METHODS FOR PLATING ON ALUMINUM AND ALUMINUM ALLOYS ATOTECH DEUTSCHLAND GMBH (DE) 2013-10-23 EP disclosed
CN-1839220-B Aqueous acidic immersion plating solutions and methods for plating on aluminum and aluminum alloys ATOTECH DEUTSCHLAND GMBH 2012-12-05 CN disclosed
WO-2005010233-A2 AQUEOUS ACIDIC IMMERSION PLATING SOLUTIONS AND METHODS FOR PLATING ON ALUMINUM AND ALUMINUM ALLOYS ATOTECH DEUTSCHLAND GMBH (DE) 2005-02-03 WO disclosed
US-20050008788-A1 Aqueous acidic immersion plating solutions and methods for plating on aluminum and aluminum alloys ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) 2005-01-13 US disclosed
WO-2004101854-A2 AQUEOUS ALKALINE ZINCATE SOLUTIONS AND METHODS ATOTECH DEUTSCHLAND GMBH (DE) 2004-11-25 WO disclosed
US-6811819-B2 IMMERSING ALUMINUM OR ALUMINUM ALLOY SUBSTRATE IN ZINCATE SOLUTION COMPRISING HYDROXIDE, ZINC, NICKEL, COBALT, IRON, AND/OR COPPER IONS; IN PRESENCE OF NITROGEN AND/OR SULFUR COMPOUND ATOTECH DEUTSCHLAND GMBH (DE) 2004-11-02 US disclosed
US-6790265-B2 NON-CYANIDE AQUEOUS ALKALINE ZINCATE SOLUTION FOR ELECTROLESS DEPOSITION OF A ZINCATE COATING ON ALUMINUM OR ALUMINUM BASES ALLOY SURFACES ATOTECH DEUTSCHLAND GMBH (DE) 2004-09-14 US disclosed
US-20040173467-A1 Aqueous alkaline zincate solutions and methods ATOTECH USA, LLC 2004-09-09 US disclosed
CN-1152679-C Melatonergic agents of benzodioxoles, benzofurans, dihydrobenzofurans and benzodioxanes ����˹�ж�-����˹˹������˾ 2004-06-09 CN disclosed
US-20040067314-A1 Aqueous alkaline zincate solutions and methods ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) 2004-04-08 US disclosed
CN-1239886-A Benzodioxole, benzofuran, dihydrobenzofuran, and benzodioxane melatonergic agent BRISTOL MYERS SQUIBB CO (US) 1999-12-29 CN disclosed
US-4293391-A Cadmium plating baths and methods for electrodepositing bright cadmium deposits ROHCO, INC. (US) 1981-10-06 US disclosed