⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL6531643 | 1.00 | LMNA (0.62) | — | |
| Bicarbonate SCHEMBL702939 | 0.87 | — | — | |
| Acrylic Acid SCHEMBL27821397 | 0.84 | — | — | |
| Oxalic Acid SCHEMBL27568890 | 0.84 | LMNA (0.39) | — | |
| Bicarbonate SCHEMBL27874307 | 0.84 | — | — | |
| Acrylic Acid SCHEMBL28937426 | 0.81 | — | — | |
| Acrylic Acid SCHEMBL28146539 | 0.79 | — | — | |
| Acrylic Acid SCHEMBL2481347 | 0.79 | — | — | |
| Acrylic Acid SCHEMBL8460539 | 0.79 | LMNA (1.00) | — | |
| Acrylic Acid SCHEMBL8085498 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1669406-B1 | THERMOPLASTIC ELASTOMER COMPOSITION | KANEKA CORP (JP) | 2008-12-24 | — | — | EP | disclosed |
| US-20080227905-A1 | Thermoplastic Elastomer Composition | KANEKA CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080199217-A1 | ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, ELECTROPHOTOGRAPHIC PROCESS CARTRIDGE INCORPORATING THE SAME, AND IMAGE FORMING APPARATUS INCORPORATING THE SAME | RICOH COMPANY, LTD. (JP) | 2008-08-21 | — | — | US | disclosed |
| EP-1669406-A1 | THERMOPLASTIC ELASTOMER COMPOSITION | KANEKA CORPORATION (JP) | 2006-06-14 | — | — | EP | disclosed |