SCHEMBL4952467

SCHEMBL4952467

C=C[Si](CC(C)C)(OCC)OCC

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5834640 0.83
SCHEMBL5833755 0.82 TSHR (0.39) TSHR
SCHEMBL5833646 0.79 HPGD (0.37) TSHR
SCHEMBL28717554 0.77
SCHEMBL128114 0.76 TSHR (0.32) TSHR
SCHEMBL931708 0.75
SCHEMBL205320 0.75
SCHEMBL931778 0.75
SCHEMBL5833381 0.74 TSHR (0.31) TSHR
SCHEMBL5834670 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274627-A1 SILICON-CONTAINING FILM, FORMING MATERIAL, MAKING METHOD, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-11-06 US disclosed
US-7291567-B2 Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2007-11-06 US disclosed
CN-1250557-C Process for preparing alkoxysilanes TOAGOSEI CO LTD (JP) 2006-04-12 CN disclosed
US-7005532-B2 Process of producing alkoxysilanes TOAGOSEI CO., LTD. (JP) 2006-02-28 US disclosed
US-20060024980-A1 Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2006-02-02 US disclosed
EP-1619226-A1 Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR Corporation (JP) 2006-01-25 EP disclosed
US-20050020845-A1 Process of producing alkoxysilanes TOAGOSEI CO., LTD. (JP) 2005-01-27 US disclosed
CN-1555380-A Process for preparing alkoxysilanes 东亚合成株式会社 2004-12-15 CN disclosed
EP-1428828-A1 PROCESS FOR PREPARATION OF ALKOXYSILANES TOAGOSEI CO., LTD. (JP) 2004-06-16 EP disclosed
US-5594079-A COORDINATION CATALYST CONTAINING BORON, STEREOREGULAR POLYPROPYLENE TOSOH CORPORATION (JP) 1997-01-14 US disclosed
US-5489634-A EFFICIENT SELECTIVE CATALYTIC POLYMERIZATION OF ALPHA-OLEFINS YIELDS HIGH MOLECULAR WEIGHT SPHERICAL PARTICLES HAVING HIGH BULK DENSITY, CONTROLLED PARTICLE SIZE AND MOLECULAR WEIGHT DISTRIBUTION TOSOH CORPORATION (JP) 1996-02-06 US disclosed
EP-0582278-A2 Method for producing a polyolefin TOSOH CORPORATION (JP) 1994-02-09 EP disclosed
EP-0530814-A1 Method for producing a stereospecific polyolefin TOSOH CORPORATION (JP) 1993-03-10 EP disclosed
US-4758547-A Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1988-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080274627-A1 SILICON-CONTAINING FILM, FORMING MATERIAL, MAKING METHOD, AND SEMICONDUCTOR DEVICE SIK1, SIK3, SIK2 TSHR 4806/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.