SCHEMBL4954464

SCHEMBL4954464

C=CCC(OCCO)C1CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4956376 0.90 MEN1 (0.34)
SCHEMBL4954912 0.90 MEN1 (0.34)
SCHEMBL7695983 0.86
Di(Hydroxyethyl)Ether SCHEMBL5922803 0.83 TSHR (0.33)
Ethylene Glycol SCHEMBL5922937 0.81 ALDH1A1 (0.31)
Triethylene Glycol SCHEMBL5922883 0.81 MEN1 (0.35)
Ammonia Solution, Strong SCHEMBL7713247 0.78 ALDH1A1 (0.38)
SCHEMBL6466036 0.77
SCHEMBL3402458 0.77 TDP1 (0.35)
SCHEMBL26629 0.77 TDP1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080206647-A1 Ethylene oxide copolymer, polymer composition, and lithium secondary battery NIPPON SHOKUBAI CO., LTD. 2008-08-28 US disclosed
US-20060264601-A1 Method for production of alkylene oxide based polymer NIPPON SHOKUBAI CO., LTD. (JP) 2006-11-23 US disclosed
US-20050245410-A1 Water soluble nonionic alkylene oxide resin, and production process therefor DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2005-11-03 US disclosed
EP-1568728-A2 Water soluble non-ionic alkylene oxide resin and production process therefor Dai-Ichi Kogyo Seiyaku Co., Ltd. (JP) 2005-08-31 EP disclosed
US-4304883-A DICYCLOPENTADIENE-MODIFIED ALKYD RESIN, UNSATURATED MONOEPOXIDE HITACHI CHEMICAL COMPANY, LTD. (JP) 1981-12-08 US disclosed