Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3670072 | 1.00 | HPGD (0.38) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL17818813 | 0.80 | HPGD (0.43) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL4211835 | 0.80 | HPGD (0.43) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL24245343 | 0.80 | HPGD (0.40) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| Hydrochloric Acid SCHEMBL17818918 | 0.78 | HPGD (0.42) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL23302263 | 0.77 | LMNA (0.34) | HPGDLMNASMN1; SMN2ALDH1A1 | |
| SCHEMBL24584729 | 0.74 | HPGD (0.46) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL19453116 | 0.74 | HPGD (0.38) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL24583813 | 0.74 | HPGD (0.46) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL3821014 | 0.74 | HPGD (0.42) | HPGDLMNASMN1; SMN2POLBKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1321487-B1 | POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE | MITSUI CHEMICALS INC (JP) | 2008-02-27 | — | — | EP | claimed |
| US-6710160-B2 | VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS | MITSUI CHEMICALS, INC. (JP) | 2004-03-23 | — | — | US | claimed |
| EP-1321487-A1 | POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE | Mitsui Chemicals, Inc. (JP) | 2003-06-25 | — | — | EP | claimed |
| US-20020188090-A1 | Polyamic acid, polyimide, process for producing these, and film of the polyimide | MITSUI CHEMICALS, INC. (JP) | 2002-12-12 | — | — | US | claimed |
| EP-1321487-B1 | POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE | MITSUI CHEMICALS INC (JP) | 2008-02-27 | — | — | EP | disclosed |
| US-6710160-B2 | VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS | MITSUI CHEMICALS, INC. (JP) | 2004-03-23 | — | — | US | disclosed |
| EP-1321487-A1 | POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE | Mitsui Chemicals, Inc. (JP) | 2003-06-25 | — | — | EP | disclosed |
| US-20020188090-A1 | Polyamic acid, polyimide, process for producing these, and film of the polyimide | MITSUI CHEMICALS, INC. (JP) | 2002-12-12 | — | — | US | disclosed |