SCHEMBL4959950

SCHEMBL4959950

CCCC(C)C(CN)CC(C)(C)C

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
METAP1 P53582 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14201306 0.82
SCHEMBL13164212 0.79 METAP1 (0.38) METAP1
SCHEMBL22664006 0.77 ALDH1A1 (0.37) METAP1
SCHEMBL10065851 0.74 ALDH1A1 (0.33)
SCHEMBL21925377 0.74 METAP1 (0.38) METAP1
SCHEMBL23032033 0.73 METAP1 (0.34) METAP1
SCHEMBL18994138 0.73 METAP1 (0.35) METAP1
SCHEMBL26084901 0.71
SCHEMBL19902305 0.71
SCHEMBL20027216 0.70 METAP1 (0.35) METAP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2251742-B1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL IND LTD (JP) 2012-05-16 EP disclosed