Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 5/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | CRHR1 | P34998 | 2/20 | 0.36 |
| ▸ | PTGES | O14684 | 2/20 | 0.34 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.33 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1041651 | 0.90 | KMT2A (0.38) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL7210994 | 0.85 | CYP3A4 (0.38) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL914117 | 0.85 | ABCB1 (0.41) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL1138265 | 0.82 | KMT2A (0.42) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL1517888 | 0.81 | KMT2A (0.38) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL1033665 | 0.81 | HPGD (0.40) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL3685860 | 0.81 | KMT2A (0.40) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL29083908 | 0.81 | LMNA (0.33) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL28935868 | 0.81 | AKR1C3 (0.50) | KMT2AMEN1LMNAHPGDSMN1; SMN2 | |
| SCHEMBL28402125 | 0.80 | TSHR (0.37) | LMNATSHRNPSR1ALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1263 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024037665-A2 | SILICONE RESIN FOR RAPID 3D PRINTING, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF | 广东工业大学 | 2024-02-22 | — | — | WO | claimed |
| US-20240052175-A1 | PROTEIN-BASED COMPOSITION FOR ADDITIVE MANUFACTURING | UNIVERSITY OF WASHINGTON (US) | 2024-02-15 | — | — | US | claimed |
| CN-115340674-B | Silicon resin for rapid 3D printing and preparation method and application thereof | 广东工业大学 | 2023-09-29 | — | — | CN | claimed |
| CN-115505332-B | Self-repairing anticorrosive coating containing polyaniline double-layer microcapsule | 江南大学 | 2023-04-07 | — | — | CN | claimed |
| CN-115785827-A | Stable OCA optical cement | 睿合科技有限公司 | 2023-03-14 | — | — | CN | claimed |
| CN-114231217-B | Optically transparent adhesive composition and optically transparent adhesive film | 苏州凡赛特材料科技有限公司 | 2023-03-10 | — | — | CN | claimed |
| CN-115505332-A | Self-repairing anticorrosive coating containing polyaniline double-layer microcapsule | 江南大学 | 2022-12-23 | — | — | CN | claimed |
| CN-115340674-A | Silicone resin for rapid 3D printing and preparation method and application thereof | 广东工业大学 | 2022-11-15 | — | — | CN | claimed |
| CN-115260835-A | High-refractive-index ink based on symmetric thioamide structure and preparation method thereof | 西安思摩威新材料有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-115181535-A | Ultraviolet light-moisture dual-curing polyurethane hot melt adhesive and preparation method thereof | 苏州合邦鑫材科技有限公司 | 2022-10-14 | — | — | CN | claimed |
| US-20060155002-A1 | Inks for ink jet printing curable by UV light initiated free radicals | XEROX CORPORATION (US) | 2006-07-13 | — | — | US | claimed |
| WO-2006060272-A2 | PROCESS AND COMPOSITION FOR COATING PROPAGATION MATERIAL | SYNGENTA PARTICIPATIONS AG (CH) | 2006-06-08 | — | — | WO | claimed |
| EP-1015505-B1 | PRODUCTION OF PHOTOPOLYMERIZED POLYESTER HIGH INDEX OPHTHALMIC LENSES | SIGNET ARMORLITE INC (US) | 2005-03-09 | — | — | EP | claimed |
| US-20030175622-A1 | High performance, photoimageable resin compositions and printing plates prepared therefrom | NAPP SYSTEMS, INC. | 2003-09-18 | — | — | US | claimed |
| US-6579664-B2 | A high performance, photoimageable resin consists of a copolymer of conjugated aliphatic diene, alpha-beta unsaturated carboxylic acid, sulfonic acid, phosphoric acid, amine and ammonium chloride; a polyfunctional acrylate | NAPP SYSTEMS, INC. | 2003-06-17 | — | — | US | claimed |
| US-20020172875-A1 | High performance, photoimageable resin compositions and printing plates prepared therefrom | CITIBANK, N.A. | 2002-11-21 | — | — | US | claimed |
| US-6099123-A | A CROSSLINKABLE CASTING POLYMERIC MATERIAL CONSISTS OF AN UNSATURATED POLYESTER, A CROSSLINKING AGENT AND A PHOTOINITIATORS | SIGNET ARMORLITE, INC. (US) | 2000-08-08 | — | — | US | claimed |
| EP-1015505-A1 | PRODUCTION OF PHOTOPOLYMERIZED POLYESTER HIGH INDEX OPHTHALMIC LENSES | SIGNET ARMORLITE, INC. (US) | 2000-07-05 | — | — | EP | claimed |
| US-5976763-A | COPOLYMER CONTAINING CONJUGATED DIENE, UNSATURATED CARBOXYLIC ACID AND OTHE RUNSATURATED COMPOUNDS | NAPP SYSTEMS, INC. | 1999-11-02 | — | — | US | claimed |
| WO-1999011682-A1 | PRODUCTION OF PHOTOPOLYMERIZED POLYESTER HIGH INDEX OPHTHALMIC LENSES | SIGNET ARMORLITE, INC. (US) | 1999-03-11 | — | — | WO | claimed |