SCHEMBL4970063

SCHEMBL4970063

Nc1ccc(C=CC=Cc2ccc(N)cc2)cc1

nearest known ligand 0.94

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
APP P05067 6/20 0.94
CYP19A1 P11511 10/20 0.62
MAOB P27338 2/20 0.62
MAOA P21397 1/20 0.62
MEN1 O00255 1/20 0.50
MAPT P10636 1/20 0.50
KMT2A Q03164 1/20 0.50
NQO2 P16083 2/20 0.46
ALDH1A1 P00352 1/20 0.42
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42
TDP1 Q9NUW8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7620786 1.00 APP (0.94) APPCYP19A1MAOBMAOAMEN1
SCHEMBL4970060 1.00 APP (0.94) APPCYP19A1MAOBMAOAMEN1
SCHEMBL7620783 1.00 APP (0.94) APPCYP19A1MAOBMAOAMEN1
SCHEMBL9750087 0.97 APP (1.00) APPCYP19A1MAOBMAOAMEN1
SCHEMBL8927226 0.97 APP (1.00) APPCYP19A1MAOBMAOAMEN1
SCHEMBL10616469 0.97 APP (1.00) APPCYP19A1MAOBMAOAMEN1
SCHEMBL8927237 0.97 APP (1.00) APPCYP19A1MAOBMAOAMEN1
SCHEMBL2831093 0.97 APP (1.00) APPCYP19A1MAOBMAOAMEN1
SCHEMBL9750157 0.97 APP (1.00) APPCYP19A1MAOBMAOAMEN1
SCHEMBL9750082 0.97 APP (1.00) APPCYP19A1MAOBMAOAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116909101-B Alkaline development negative photosensitive polyimide photoresist based on click reaction 广东工业大学 2024-05-24 CN claimed
CN-116909101-A Alkaline development negative photosensitive polyimide photoresist based on click reaction 广东工业大学 2023-10-20 CN claimed
JP-59129857-A None JP disclosed
JP-58222153-A None JP disclosed
CN-116909101-B Alkaline development negative photosensitive polyimide photoresist based on click reaction 广东工业大学 2024-05-24 CN disclosed
CN-116909101-A Alkaline development negative photosensitive polyimide photoresist based on click reaction 广东工业大学 2023-10-20 CN disclosed
EP-0980016-B1 ALIGNING AGENT FOR LIQUID CRYSTAL NISSAN CHEMICAL IND LTD (JP) 2008-09-24 EP disclosed
US-6274695-B1 THIN FILM POLYMER NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2001-08-14 US disclosed
EP-0980016-A1 ALIGNING AGENT FOR LIQUID CRYSTAL Nissan Chemical Industries, Ltd. (JP) 2000-02-16 EP disclosed
US-4486519-A HIGH PHOTOSENSITYIVITY AND FLEXIBILITY RICOH COMPANY, LTD. (JP) 1984-12-04 US disclosed
JP-S59129857-A ELECTROPHOTOGRAPHIC SENSITIVE BODY RICOH CO LTD 1984-07-26 JP disclosed
JP-S58222153-A NEW DISAZO COMPOUND AND PREPARATION THEREOF RICOH CO LTD 1983-12-23 JP disclosed