Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30209941 | 0.90 | — | — | |
| SCHEMBL30210000 | 0.89 | — | — | |
| SCHEMBL30209984 | 0.88 | — | — | |
| SCHEMBL30210023 | 0.87 | SMN1; SMN2 (0.31) | — | |
| SCHEMBL30209846 | 0.86 | — | — | |
| SCHEMBL30209856 | 0.86 | — | — | |
| SCHEMBL30209840 | 0.85 | ALDH1A1 (0.32) | — | |
| SCHEMBL30210022 | 0.85 | — | — | |
| SCHEMBL30210052 | 0.84 | — | — | |
| SCHEMBL30209993 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118638302-A | Cycloolefin monomer composition, cycloolefin ring-opening polymer hydride and optical material | 杭州睿丰融创科技有限公司 | 2024-09-13 | — | — | CN | disclosed |
| US-20240287268-A1 | RESIN FILM | MURATA MANUFACTURING CO., LTD. (JP) | 2024-08-29 | — | — | US | disclosed |
| US-20240239952-A1 | MATERIALS FOR RING-OPENING METATHESIS POLYMERIZATION AND USES THEREOF | Inkbit, LLC (US) | 2024-07-18 | — | — | US | disclosed |
| US-20240239952-A1 | MATERIALS FOR RING-OPENING METATHESIS POLYMERIZATION AND USES THEREOF | Inkbit, LLC (US) | 2024-07-18 | — | — | US | disclosed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| WO-2023203907-A1 | RESIN FILM | 株式会社村田製作所 | 2023-10-26 | — | — | WO | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | disclosed |
| US-20110198730-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION | 2011-08-18 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| WO-2007057773-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-24 | — | — | WO | disclosed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| US-7205086-B2 | Multilayer elements containing photoresist compositions and their use in microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-04-17 | — | — | US | disclosed |
| US-7205086-B2 | Multilayer elements containing photoresist compositions and their use in microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-04-17 | — | — | US | disclosed |
| EP-1770104-A1 | METHOD FOR PRODUCING (CO)POLYMER HAVING CARBOXYL GROUP | JSR Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-6846895-B2 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |