⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1727698 | 0.65 | — | — | |
| SCHEMBL11456086 | 0.64 | ESR1 (0.43) | — | |
| SCHEMBL1768412 | 0.63 | — | — | |
| SCHEMBL5256 | 0.62 | — | — | |
| SCHEMBL220987 | 0.62 | — | — | |
| SCHEMBL277548 | 0.62 | — | — | |
| SCHEMBL3651286 | 0.61 | — | — | |
| SCHEMBL8914404 | 0.60 | — | — | |
| SCHEMBL11437332 | 0.60 | — | — | |
| SCHEMBL7198316 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116199643-A | Phenothiazine compound containing isopropanol substructure, and preparation and application thereof | 贵州大学 | 2023-06-02 | — | — | CN | claimed |
| CN-116041308-A | Seven-membered cyclic saccharide compound, and preparation method and application thereof | 贵州省中国科学院天然产物化学重点实验室(贵州医科大学天然产物化学重点实验室) | 2023-05-02 | — | — | CN | claimed |
| CN-110713588-B | Hardmask composition, hardmask layer and method of forming pattern | 三星SDI株式会社 | 2022-08-09 | — | — | CN | claimed |
| CN-114181148-A | 'on-off' type fluorescent probe, preparation method and application thereof | 东北农业大学 | 2022-03-15 | — | — | CN | claimed |
| US-11214678-B2 | Hardmask composition, hardmask layer and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2022-01-04 | — | — | US | claimed |
| CN-110713588-A | Hardmask composition, hardmask layer and method of forming pattern | 三星SDI株式会社 | 2020-01-21 | — | — | CN | claimed |
| CN-110078721-A | Dioctyl glutaricate and its preparation method and application of the one kind containing triazine | 贵州大学 | 2019-08-02 | — | — | CN | claimed |
| CN-109721554-A | A kind of 4- amino-quinazoline compound and its preparation method and application | 贵州大学 | 2019-05-07 | — | — | CN | claimed |
| CN-109535144-A | A kind of 1,3,4- oxadiazoles thio-ether type compounds and its preparation method and application | 贵州大学 | 2019-03-29 | — | — | CN | claimed |
| EP-2428577-B1 | Preparation of tyrosinase-inhibiting hydroxybenzyl and hydroxypyranonemethyl esters | EASTMAN CHEM CO (US) | 2014-01-22 | — | — | EP | claimed |
| EP-2428577-A1 | Preparation of tyrosinase-inhibiting hydroxybenzyl and hydroxypyranonemethyl esters | EASTMAN CHEMICAL COMPANY (US) | 2012-03-14 | — | — | EP | claimed |
| US-20110129430-A1 | HYDROXYBENZYL OR HYDROXYPYRANONEMETHYL ESTERS AS TYROSINASE INHIBITORS | EASTMAN CHEMICAL COMPANY (US) | 2011-06-02 | — | — | US | claimed |
| EP-2155886-A2 | HYDROXYBENZYL OR HYDROXYPYRANONEMETHYL ESTERS AS TYROSINASE INHIBITORS | Eastman Chemical Company (US) | 2010-02-24 | — | — | EP | claimed |
| WO-2008153784-A2 | HYDROXYBENZYL OR HYDROXYPYRANONEMETHYL ESTERS AS TYROSINASE INHIBITORS | EASTMAN CHEMICAL COMPANY (US) | 2008-12-18 | — | — | WO | claimed |
| US-20080306144-A1 | Hydroxybenzyl or hydroxypyranonemethyl esters as tyrosinase inhibitors | EASTMAN CHEMICAL COMPANY | 2008-12-11 | — | — | US | claimed |
| WO-2008143777-A1 | HYDROQUINONE DERIVATIVE SKIN BRIGHTENING COMPOUNDS | EASTMAN CHEMICAL COMPANY (US) | 2008-11-27 | — | — | WO | claimed |
| US-20080286219-A1 | Hydroquinone derivative skin brightening compounds | EASTMAN CHEMICAL COMPANY | 2008-11-20 | — | — | US | claimed |
| EP-0973768-A1 | AZOLE COMPOUNDS, THEIR PRODUCTION AND THEIR USE | Takeda Chemical Industries, Ltd. (JP) | 2000-01-26 | — | — | EP | claimed |
| WO-1998043970-A1 | AZOLE COMPOUNDS, THEIR PRODUCTION AND THEIR USE | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1998-10-08 | — | — | WO | claimed |
| US-20240045330-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-117486770-A | 2-cyanoacrylate compound and preparation method and application thereof | 贵州大学 | 2024-02-02 | — | — | CN | disclosed |
| CN-117420731-A | Negative photosensitive composition and pattern forming method | 东京应化工业株式会社 | 2024-01-19 | — | — | CN | disclosed |
| CN-113286781-B | Sulfonium salt, photoacid generator, curable composition, and resist composition | 三亚普罗股份有限公司 | 2023-08-08 | — | — | CN | disclosed |
| US-20230236505-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM | SAN-APRO LTD. (JP) | 2023-07-27 | — | — | US | disclosed |
| CN-113461634-B | Thiazole hydrazide compound and preparation method and application thereof | 贵州大学 | 2023-07-04 | — | — | CN | disclosed |
| CN-116199643-A | Phenothiazine compound containing isopropanol substructure, and preparation and application thereof | 贵州大学 | 2023-06-02 | — | — | CN | disclosed |
| CN-116018558-A | Negative photosensitive resin composition, pattern forming method and laminated film | 三亚普罗股份有限公司 | 2023-04-25 | — | — | CN | disclosed |
| CN-115542666-A | Photosensitive resin composition for spacer and protective film | 奇美实业股份有限公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-110713588-B | Hardmask composition, hardmask layer and method of forming pattern | 三星SDI株式会社 | 2022-08-09 | — | — | CN | disclosed |
| CN-114181148-B | 'on-off' type fluorescent probe, preparation method and application thereof | 东北农业大学 | 2022-08-05 | — | — | CN | disclosed |
| CN-110078721-B | Triazine-containing pentadiene ketone compound and preparation method and application thereof | 贵州大学 | 2022-03-25 | — | — | CN | disclosed |
| CN-114181148-A | 'on-off' type fluorescent probe, preparation method and application thereof | 东北农业大学 | 2022-03-15 | — | — | CN | disclosed |
| US-11214678-B2 | Hardmask composition, hardmask layer and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2022-01-04 | — | — | US | disclosed |
| EP-3909943-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | San-Apro Ltd. (JP) | 2021-11-17 | — | — | EP | disclosed |
| CN-113620894-A | Oxadiazole thioether compounds containing amide substructure as well as preparation method and application thereof | 贵州大学 | 2021-11-09 | — | — | CN | disclosed |
| CN-113461634-A | Thiazole hydrazide compounds and preparation method and application thereof | 贵州大学 | 2021-10-01 | — | — | CN | disclosed |
| CN-113286781-A | Sulfonium salt, photoacid generator, curable composition, and resist composition | 三亚普罗股份有限公司 | 2021-08-20 | — | — | CN | disclosed |
| WO-2020145043-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION | サンアプロ株式会社 | 2020-07-16 | — | — | WO | disclosed |
| CN-111393359-A | Pyridine salt-containing N- (cinnamoyl) -N' - (substituted) propyl hydrazide compound and preparation method and application thereof | 贵州大学 | 2020-07-10 | — | — | CN | disclosed |
| CN-110713588-A | Hardmask composition, hardmask layer and method of forming pattern | 三星SDI株式会社 | 2020-01-21 | — | — | CN | disclosed |
| CN-110078721-A | Dioctyl glutaricate and its preparation method and application of the one kind containing triazine | 贵州大学 | 2019-08-02 | — | — | CN | disclosed |
| CN-106659161-B | Amide compound and its harmful arthropod prevent and kill off purposes | 住友化学株式会社 | 2019-08-02 | — | — | CN | disclosed |
| CN-109721554-A | A kind of 4- amino-quinazoline compound and its preparation method and application | 贵州大学 | 2019-05-07 | — | — | CN | disclosed |
| US-10251396-B2 | Amide compound and use of same for noxious arthropod control | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-04-09 | — | — | US | disclosed |
| CN-109535144-A | A kind of 1,3,4- oxadiazoles thio-ether type compounds and its preparation method and application | 贵州大学 | 2019-03-29 | — | — | CN | disclosed |
| CN-105873911-B | Thiazolium compounds and its Pesticidal purposes | 住友化学株式会社 | 2018-07-24 | — | — | CN | disclosed |
| EP-2952096-B1 | Amide compound, an arthropod pest control agent and a method for controlling arthropod pest | SUMITOMO CHEMICAL CO (JP) | 2018-04-04 | — | — | EP | disclosed |
| US-9814235-B2 | Method for controlling arthropod pest | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-14 | — | — | US | disclosed |
| US-20170295789-A1 | AMIDE COMPOUND AND USE OF SAME FOR NOXIOUS ARTHROPOD CONTROL | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-19 | — | — | US | disclosed |
| US-9730449-B2 | Thiazole compound and its use in pest control | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-15 | — | — | US | disclosed |
| EP-3178322-A1 | AMIDE COMPOUND AND USE OF SAME FOR NOXIOUS ARTHROPOD CONTROL | Sumitomo Chemical Company Limited (JP) | 2017-06-14 | — | — | EP | disclosed |
| CN-106659161-A | Amide compound and use of same for noxious arthropod control | 住友化学株式会社 | 2017-05-10 | — | — | CN | disclosed |
| CN-104955332-B | The method of preventing and treating arthropod insect | 住友化学株式会社 | 2017-03-29 | — | — | CN | disclosed |
| EP-3093286-A1 | THIAZOLE COMPOUNDS AND PEST CONTROL APPLICATIONS THEREOF | Sumitomo Chemical Co., Ltd (JP) | 2016-11-16 | — | — | EP | disclosed |
| US-20160324155-A1 | THIAZOLE COMPOUND AND ITS USE IN PEST CONTROL | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-10 | — | — | US | disclosed |
| CN-105873911-A | Thiazole compounds and pest control applications thereof | 住友化学株式会社 | 2016-08-17 | — | — | CN | disclosed |
| EP-2952096-A1 | METHOD FOR CONTROLLING ARTHROPOD PEST | Sumitomo Chemical Company, Limited (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-20150344466-A1 | METHOD FOR CONTROLLING ARTHROPOD PEST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-12-03 | — | — | US | disclosed |
| CN-104955332-A | Method for controlling arthropod pest | SUMITOMO CHEMICAL CO | 2015-09-30 | — | — | CN | disclosed |
| US-20150005348-A1 | AMIDE COMPOUND AND USE THEREOF FOR PEST CONTROL | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-01 | — | — | US | disclosed |
| EP-2813492-A1 | AMIDE COMPOUND AND USE THEREOF FOR PEST CONTROL | Sumitomo Chemical Co., Ltd (JP) | 2014-12-17 | — | — | EP | disclosed |
| CN-104105694-A | Amide compound and use thereof for pest control | SUMITOMO CHEMICAL CO | 2014-10-15 | — | — | CN | disclosed |
| EP-2428577-B1 | Preparation of tyrosinase-inhibiting hydroxybenzyl and hydroxypyranonemethyl esters | EASTMAN CHEM CO (US) | 2014-01-22 | — | — | EP | disclosed |
| EP-2284165-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | SAN APRO LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| CN-102712587-A | Novel ethane diamine hepcidin antagonists | VIFOR INT AG | 2012-10-03 | — | — | CN | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| EP-2428577-A1 | Preparation of tyrosinase-inhibiting hydroxybenzyl and hydroxypyranonemethyl esters | EASTMAN CHEMICAL COMPANY (US) | 2012-03-14 | — | — | EP | disclosed |
| EP-2155886-B1 | Cosmetic use of inhibitors of tyrosinase | EASTMAN CHEM CO (US) | 2012-03-07 | — | — | EP | disclosed |
| US-8129467-B2 | Curing accelerating compound-silica composite material, method for producing curing accelerating compound-silica composite material, curing accelerator, curable resin composition, and electronic component device | HITACHI CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-8013052-B2 | Curable resin, production method thereof, epoxy resin composition, and electronic device | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-09-06 | — | — | US | disclosed |
| US-20110129430-A1 | HYDROXYBENZYL OR HYDROXYPYRANONEMETHYL ESTERS AS TYROSINASE INHIBITORS | EASTMAN CHEMICAL COMPANY (US) | 2011-06-02 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-1994011-B1 | SULFONYL BENZIMIDAZOLE DERIVATIVES | RAQUALIA PHARMA INC (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100240908-A1 | ACETYLENE COMPOUND | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| EP-2202221-A1 | ACETYLENE COMPOUND | Fujifilm Corporation (JP) | 2010-06-30 | — | — | EP | disclosed |
| US-7700618-B2 | Sulfonyl benzimidazole derivatives | PFIZER INC (US) | 2010-04-20 | — | — | US | disclosed |
| EP-2155886-A2 | HYDROXYBENZYL OR HYDROXYPYRANONEMETHYL ESTERS AS TYROSINASE INHIBITORS | Eastman Chemical Company (US) | 2010-02-24 | — | — | EP | disclosed |
| US-7666953-B2 | Phosphine-protonated haloaromatic compound accelerator with curing resin and curing agent | HITACHI CHEMICAL CO, LTD. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-7598393-B2 | Sulfonyl benzimidazole derivatives | PFIZER INC. (US) | 2009-10-06 | — | — | US | disclosed |
| US-7585904-B2 | Curing accelerator comprising a reaction product of an intramolecular phosphonium salt and a silanol compound; suitable as a material for laminates and adhesives and an electronic parts device comprising an element that has been encapsulated using such a curable resin composition | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-09-08 | — | — | US | disclosed |
| US-20090137584-A1 | SULFONYL BENZIMIDAZOLE DERIVATIVES | RAQUALIA PHARMA INC. (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090062460-A1 | CURING ACCELERATING COMPOUND-SILICA COMPOSITE MATERIAL, METHOD FOR PRODUCING CURING ACCELERATING COMPOUND-SILICA COMPOSITE MATERIAL, CURING ACCELERATOR, CURABLE RESIN COMPOSITION, AND ELECTRONIC COMPONENT DEVICE | HITACHI CHEMICAL CO., LTD. (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090023855-A1 | NOVEL CURABLE RESIN, PRODUCTION METHOD THEREOF, EPOXY RESIN COMPOSITION, AND ELECTRONIC DEVICE | RESONAC CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |
| US-20090012232-A1 | Curing accelerator comprising a reaction product of an intramolecular phosphonium salt and a silanol compound; suitable as a material for laminates and adhesives and an electronic parts device comprising an element that has been encapsulated using such a curable resin composition | HITACHI CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-20090005480-A1 | REACTION PRODUCT OF PHOSPHINE AND PROTONATED HALOARYL COMPOUND AND USE AS EPOXY CURING ACCELERATOR | NAKAMURA SHINYA | 2009-01-01 | — | — | US | disclosed |
| WO-2008153784-A2 | HYDROXYBENZYL OR HYDROXYPYRANONEMETHYL ESTERS AS TYROSINASE INHIBITORS | EASTMAN CHEMICAL COMPANY (US) | 2008-12-18 | — | — | WO | disclosed |
| EP-1809607-B1 | SULFONYL BENZIMIDAZOLE DERIVATIVES | PFIZER (US) | 2008-12-17 | — | — | EP | disclosed |
| US-20080306144-A1 | Hydroxybenzyl or hydroxypyranonemethyl esters as tyrosinase inhibitors | EASTMAN CHEMICAL COMPANY | 2008-12-11 | — | — | US | disclosed |
| WO-2008143777-A1 | HYDROQUINONE DERIVATIVE SKIN BRIGHTENING COMPOUNDS | EASTMAN CHEMICAL COMPANY (US) | 2008-11-27 | — | — | WO | disclosed |
| EP-1994011-A1 | SULFONYL BENZIMIDAZOLE DERIVATIVES | Pfizer, Inc. (US) | 2008-11-26 | — | — | EP | disclosed |
| US-20080286219-A1 | Hydroquinone derivative skin brightening compounds | EASTMAN CHEMICAL COMPANY | 2008-11-20 | — | — | US | disclosed |
| US-20080262135-A1 | REACTION PRODUCT OF PHOSPHINE AND PROTONATED HALOARYL COMPOUND AND USE AS EPOXY CURING ACCELERATOR | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-10-23 | — | — | US | disclosed |
| WO-2007102059-A1 | SULFONYL BENZIMIDAZOLE DERIVATIVES | PFIZER JAPAN INC. (JP) | 2007-09-13 | — | — | WO | disclosed |
| EP-1809607-A1 | SULFONYL BENZIMIDAZOLE DERIVATIVES | Pfizer, Inc. (US) | 2007-07-25 | — | — | EP | disclosed |
| WO-2006048754-A1 | SULFONYL BENZIMIDAZOLE DERIVATIVES | PFIZER JAPAN INC. (JP) | 2006-05-11 | — | — | WO | disclosed |
| US-20060094750-A1 | Sulfonyl benzimidazole derivatives | KON-I KANA | 2006-05-04 | — | — | US | disclosed |
| US-20050267286-A1 | Curing accelerator for curing resin, curing resin composition, electronic component device and method for producing phosphine derivative | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| EP-1341766-B1 | IMIDAZOLONE DERIVATIVES FOR THE TREATMENT OF VIRAL DISEASES | HOFFMANN LA ROCHE (CH) | 2005-10-26 | — | — | EP | disclosed |
| US-20050165202-A1 | Curing accelerator for curing resin, curing resin composition and electronic component device | HITACHI CHEMICAL CO., LTD. (JP) | 2005-07-28 | — | — | US | disclosed |
| EP-0923569-B1 | BUTYRIC ACID MATRIX METALLOPROTEINASE INHIBITORS | WARNER LAMBERT CO (US) | 2004-11-17 | — | — | EP | disclosed |
| US-6583164-B1 | Lyophilized imidazole-1-yl or 1,2,4-triazole-1-yl quaternized with a alklycarbonyloxy alkyl group eliminated in vivo; a saccharide; 4-acetoxymethyl-1-(3-(2-oxo-3-(4-(1H-tetrazol-yl) phenyl)-1-imidazolydinyl)butyl)-1H-1,2,4-triazolium chloride | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 2003-06-24 | — | — | US | disclosed |
| US-6518293-B2 | Inhibitors of the human immunodeficiency virus reverse transcriptase enzyme which is involved in viral replication. | HOFFMANN-LA ROCHE INC. | 2003-02-11 | — | — | US | disclosed |
| US-20020107272-A1 | Anti-HIV imidazolone derivatives | F. HOFFMANN-LA ROCHE AG (CH) | 2002-08-08 | — | — | US | disclosed |
| US-6407129-B1 | INJECTABLE QUATERNIZED SALT FUNGICIDES; WATER SOLUBILITY | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 2002-06-18 | — | — | US | disclosed |
| EP-1120116-A1 | ANTIMYCOTIC DRUG COMPOSITION | Takeda Chemical Industries, Ltd. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-6020366-A | Butyric acid matrix metalloproteinase inhibitors | WARNER-LAMBERT COMPANY (US) | 2000-02-01 | — | — | US | disclosed |
| EP-0973768-A1 | AZOLE COMPOUNDS, THEIR PRODUCTION AND THEIR USE | Takeda Chemical Industries, Ltd. (JP) | 2000-01-26 | — | — | EP | disclosed |
| EP-0923569-A1 | BUTYRIC ACID MATRIX METALLOPROTEINASE INHIBITORS | WARNER-LAMBERT COMPANY (US) | 1999-06-23 | — | — | EP | disclosed |
| WO-1998043970-A1 | AZOLE COMPOUNDS, THEIR PRODUCTION AND THEIR USE | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1998-10-08 | — | — | WO | disclosed |
| WO-1998006711-A1 | BUTYRIC ACID MATRIX METALLOPROTEINASE INHIBITORS | WARNER-LAMBERT COMPANY (US) | 1998-02-19 | — | — | WO | disclosed |
| EP-0492178-B1 | Naphthoic acid derivative | FUJIREBIO KK (JP) | 1995-10-04 | — | — | EP | disclosed |
| US-5324728-A | Lipoxygenase inhibiting antiallergens | FUJIREBIO INC. (JP) | 1994-06-28 | — | — | US | disclosed |
| EP-0492178-A2 | Naphthoic acid derivative | FUJIREBIO INC. (JP) | 1992-07-01 | — | — | EP | disclosed |
| EP-0492178-A2 | Naphthoic acid derivative | FUJIREBIO INC. (JP) | 1992-07-01 | — | — | EP | disclosed |