Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | FNTA | P49354 | 2/20 | 0.31 |
| ▸ | FNTB | P49356 | 2/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | PGGT1B | P53609 | 1/20 | 0.31 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.31 |
| ▸ | GRIA4 | P48058 | 1/20 | 0.31 |
| ▸ | GRIK3 | Q13003 | 1/20 | 0.31 |
| ▸ | GRIK5 | Q16478 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10901739 | 0.86 | ALDH1A1 (0.33) | ALDH1A1GRIK1 | |
| SCHEMBL8514554 | 0.83 | ALDH1A1 (0.36) | ALDH1A1TSHRFFAR3TDP1FNTA | |
| SCHEMBL9860955 | 0.82 | ALDH1A1 (0.39) | ALDH1A1TSHRFFAR3GRIK1GRIA4 | |
| Fluorene SCHEMBL29947947 | 0.79 | SRD5A2 (0.39) | ALDH1A1TSHR | |
| SCHEMBL9285451 | 0.77 | ALDH1A1 (0.34) | ALDH1A1TSHRFFAR3 | |
| SCHEMBL491046 | 0.77 | GRIK1 (0.33) | ALDH1A1FFAR3TDP1FNTAFNTB | |
| SCHEMBL17165735 | 0.76 | FFAR3 (0.42) | ALDH1A1FFAR3TDP1FNTAFNTB | |
| SCHEMBL3268314 | 0.76 | FFAR3 (0.42) | ALDH1A1FFAR3TDP1FNTAFNTB | |
| SCHEMBL3683540 | 0.75 | ALDH1A1 (0.35) | ALDH1A1FNTAFNTBTHRBPGGT1B | |
| SCHEMBL1644504 | 0.75 | ALDH1A1 (0.35) | ALDH1A1FNTAFNTBTHRBPGGT1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1353228-B1 | Method for forming a relief image using a very thick photoresist layer on a semiconductor wafer and metal plating method | ROHM & HAAS ELECT MAT (US) | 2015-01-28 | — | — | EP | disclosed |
| US-7344970-B2 | Plating method | SHIPLEY COMPANY, L.L.C. (US) | 2008-03-18 | — | — | US | disclosed |
| US-20040018724-A1 | Plating method | SHIPLEY COMPANY, L.L.C (US) | 2004-01-29 | — | — | US | disclosed |
| EP-1353228-A1 | Method for depositing a very thick photoresist layer on a substrate and metal plating method | Shipley Co. L.L.C. (US) | 2003-10-15 | — | — | EP | disclosed |