SCHEMBL4992965

SCHEMBL4992965

O=S(=O)(OS1(c2ccc3ccccc3c2)CCCC1)C(F)(F)C(F)(F)C1CC2CCC1C2

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 3/20 0.34
SLC6A3 Q01959 3/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL447417 0.85 TSHR (0.32)
SCHEMBL4997241 0.77 CA1 (0.34)
SCHEMBL5866199 0.77 ALDH1A1 (0.33)
SCHEMBL4996681 0.77 SLC6A4 (0.36) SLC6A4SLC6A3
SCHEMBL4992954 0.76 CA1 (0.35)
SCHEMBL4995389 0.76
SCHEMBL4986620 0.76 SCN9A (0.30)
SCHEMBL4996331 0.76
SCHEMBL4996552 0.75 CA1 (0.30)
SCHEMBL5866206 0.75 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 US disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 EP disclosed