SCHEMBL4993290

SCHEMBL4993290

CCCCCCCOc1ccc2cc(S3(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)CCCC3)ccc2c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
THRA P10827 3/20 0.35
MTNR1A P48039 2/20 0.35
CA12 O43570 1/20 0.34
CA3 P07451 1/20 0.34
CA4 P22748 1/20 0.34
CA6 P23280 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
CA14 Q9ULX7 1/20 0.34
CA5B Q9Y2D0 1/20 0.34
THRB P10828 2/20 0.33
PDK2 Q15119 1/20 0.33
TSHR P16473 1/20 0.33
MAPK1 P28482 1/20 0.33
RECQL P46063 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
LTA4H P09960 1/20 0.32
NPC1 O15118 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4994535 1.00 CA1 (0.36) CA1CA2THRAMTNR1ACA12
SCHEMBL5002070 1.00 CA1 (0.36) CA1CA2THRAMTNR1ACA12
SCHEMBL4996700 0.99 CA1 (0.37) CA1CA2THRAMTNR1ACA12
SCHEMBL446602 0.97 CA1 (0.38) CA1CA2MTNR1ACA12CA3
SCHEMBL445117 0.96 CA1 (0.39) CA1CA2CA12CA3CA4
SCHEMBL3164931 0.88 TSHR (0.40) CA1CA2CA12CA7CA9
SCHEMBL3164780 0.87 TSHR (0.39) CA1CA2CA12CA7CA9
SCHEMBL4993017 0.87 CNR2 (0.36) THRB
SCHEMBL4991289 0.87 CNR2 (0.36) THRB
SCHEMBL4999475 0.87 CNR2 (0.36) THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 US disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 EP disclosed