SCHEMBL4993017

SCHEMBL4993017

CCCCCCCSc1ccc2cc(S3(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)CCCC3)ccc2c1

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 2/20 0.36
THRB P10828 1/20 0.31
AR P10275 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4991289 1.00 CNR2 (0.36) CNR2THRBAR
SCHEMBL4999475 1.00 CNR2 (0.36) CNR2THRBAR
SCHEMBL4996874 0.99 CNR2 (0.35) CNR2THRBAR
SCHEMBL5002265 0.96 AR (0.34) CNR2AR
SCHEMBL4994535 0.87 CA1 (0.36) THRB
SCHEMBL4993290 0.87 CA1 (0.36) THRB
SCHEMBL5002070 0.87 CA1 (0.36) THRB
SCHEMBL4996700 0.86 CA1 (0.37) THRB
SCHEMBL446602 0.85 CA1 (0.38)
SCHEMBL4996819 0.85 HTR2A (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 US disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 EP disclosed