Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.34 |
| ▸ | CA2 | P00918 | 4/20 | 0.34 |
| ▸ | BCHE | P06276 | 1/20 | 0.31 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.30 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.30 |
| ▸ | HTR2A | P28223 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4993362 | 0.97 | CA2 (0.34) | CA1CA2BCHES1PR1S1PR3 | |
| SCHEMBL4996582 | 0.96 | HTR2A (0.35) | CA1CA2S1PR1S1PR3HTR2A | |
| SCHEMBL4993915 | 0.96 | HTR2A (0.35) | CA1CA2S1PR1S1PR3HTR2A | |
| SCHEMBL4996819 | 0.96 | HTR2A (0.35) | CA1CA2S1PR1S1PR3HTR2A | |
| SCHEMBL446602 | 0.87 | CA1 (0.38) | CA1CA2 | |
| SCHEMBL445117 | 0.86 | CA1 (0.39) | CA1CA2 | |
| SCHEMBL4993977 | 0.85 | CA1 (0.32) | CA1CA2 | |
| SCHEMBL4996700 | 0.85 | CA1 (0.37) | CA1CA2HTR2A | |
| SCHEMBL4994492 | 0.85 | CA1 (0.31) | CA1CA2 | |
| SCHEMBL4994020 | 0.85 | CA1 (0.31) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |