⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5002199 | 0.99 | — | — | |
| SCHEMBL4996571 | 0.84 | AKR1C3 (0.32) | — | |
| SCHEMBL5002123 | 0.84 | — | — | |
| SCHEMBL4997138 | 0.84 | LMNA (0.32) | — | |
| SCHEMBL4996326 | 0.83 | — | — | |
| SCHEMBL4997238 | 0.83 | MCOLN3 (0.35) | — | |
| SCHEMBL4995775 | 0.83 | LMNA (0.33) | — | |
| SCHEMBL4994083 | 0.83 | CNR2 (0.31) | — | |
| SCHEMBL4991056 | 0.82 | PTGS1 (0.34) | — | |
| SCHEMBL5002112 | 0.82 | AR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |