⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1820316 | 0.81 | — | — | |
| SCHEMBL431201 | 0.78 | — | — | |
| SCHEMBL28570062 | 0.77 | — | — | |
| SCHEMBL4999744 | 0.77 | — | — | |
| SCHEMBL29201596 | 0.77 | — | — | |
| SCHEMBL26329680 | 0.77 | — | — | |
| SCHEMBL25404733 | 0.73 | — | — | |
| SCHEMBL4999749 | 0.73 | LMNA (0.32) | — | |
| SCHEMBL28728889 | 0.73 | — | — | |
| SCHEMBL29201638 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117924346-A | Multi-sulfur-containing silane coupling agent and preparation method thereof | 江西宏柏新材料股份有限公司 | 2024-04-26 | — | — | CN | claimed |
| US-11059920-B2 | Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions | BRIDGESTONE CORPORATION (JP) | 2021-07-13 | — | — | US | claimed |
| US-20190169330-A1 | Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions | BRIDGESTONE CORPORATION (JP) | 2019-06-06 | — | — | US | claimed |
| EP-3491030-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | Bridgestone Corporation (JP) | 2019-06-05 | — | — | EP | claimed |
| CN-109715680-A | The method for preparing high-cis -1,4- polydiene with the carbon monoxide-olefin polymeric based on lanthanide series | 株式会社普利司通 | 2019-05-03 | — | — | CN | claimed |
| WO-2018022994-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORPORATION (JP) | 2018-02-01 | — | — | WO | claimed |
| CN-109641430-B | Photocatalyst laminate | 信越化学工业株式会社 | 2022-03-11 | — | — | CN | disclosed |
| EP-3505343-B1 | PHOTOCATALYST LAMINATE | SHINETSU CHEMICAL CO (JP) | 2022-01-12 | — | — | EP | disclosed |
| US-11161097-B2 | Photocatalyst laminate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-02 | — | — | US | disclosed |
| CN-109715680-B | Process for preparing high cis-1, 4-polydienes with lanthanide-based catalyst compositions | 株式会社普利司通 | 2021-10-19 | — | — | CN | disclosed |
| US-11059920-B2 | Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions | BRIDGESTONE CORPORATION (JP) | 2021-07-13 | — | — | US | disclosed |
| EP-3491030-B1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORP (JP) | 2021-03-24 | — | — | EP | disclosed |
| EP-3178876-B1 | INORGANIC PARTICLE-POLYSILOXANE COMPOSITE, DISPERSION AND SOLID MATERIAL CONTAINING THE COMPOSITE, AND MAKING METHOD | SHINETSU CHEMICAL CO (JP) | 2020-10-21 | — | — | EP | disclosed |
| CN-100335488-C | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2007-09-05 | — | — | CN | disclosed |
| US-7160625-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2007-01-09 | — | — | US | disclosed |
| CN-1803805-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1793151-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-06-28 | — | — | CN | disclosed |
| US-20060127683-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2006-06-15 | — | — | US | disclosed |
| US-20030180550-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2003-09-25 | — | — | US | disclosed |
| CN-1437228-A | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2003-08-20 | — | — | CN | disclosed |