SCHEMBL5000788

SCHEMBL5000788

O=C(OCc1ccccc1)On1nnc2ccccc21

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 3/20 0.52
▸ RAB9A P51151 3/20 0.52
▸ SMN1; SMN2 Q16637 2/20 0.52
▸ ALDH1A1 P00352 1/20 0.51
▸ SIRT2 Q8IXJ6 3/20 0.50
▸ HDAC3 O15379 3/20 0.49
▸ HDAC4 P56524 3/20 0.49
▸ HDAC1 Q13547 3/20 0.49
▸ HDAC7 Q8WUI4 3/20 0.49
▸ HDAC2 Q92769 3/20 0.49
▸ HDAC10 Q969S8 3/20 0.49
▸ HDAC11 Q96DB2 3/20 0.49
▸ HDAC8 Q9BY41 3/20 0.49
▸ HDAC6 Q9UBN7 3/20 0.49
▸ HDAC9 Q9UKV0 3/20 0.49
▸ HDAC5 Q9UQL6 3/20 0.49
▸ TSHR P16473 1/20 0.49
▸ NPSR1 Q6W5P4 1/20 0.49
▸ RXFP1 Q9HBX9 1/20 0.49
▸ KMT2A Q03164 4/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14123347 0.85 SIRT2 (0.55) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL13534945 0.85 NPC1 (0.50) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL39113 0.83 SIRT2 (0.61) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL29773981 0.83 SIRT2 (0.61) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL6538725 0.83 NPC1 (0.50) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL277619 0.83 HDAC3 (0.54) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL31729907 0.82 KDM4E (0.49) NPC1RAB9ASMN1; SMN2ALDH1A1HTT
SCHEMBL125531 0.82 SIRT2 (0.51) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL15459767 0.82 SIRT2 (0.51) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2
SCHEMBL6538945 0.81 HTT (0.51) NPC1RAB9ASMN1; SMN2ALDH1A1SIRT2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250355350-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-20 — — US disclosed
EP-4650874-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-19 — — EP disclosed
US-8785635-B2 Cyclopamine analogs INFINITY PHARMACEUTICALS, INC. (US) 2014-07-22 — — US disclosed
EP-2096917-B1 CYCLOPAMINE ANALOGS INFINITY DISCOVERY INC (US) 2014-05-07 — — EP disclosed
US-7812164-B2 steroidal alkaloids; for treatment of disorders mediated by hedgehog pathway such as cancer INFINITY PHARMACEUTICALS, INC. (US) 2010-10-12 — — US disclosed
US-7449532-B2 Cycloolefin copolymer obtained by ring-opening polymerization, use thereof, and process for producing retardation plate comprising the copolymer JSR CORPORATION (JP) 2008-11-11 — — US disclosed
US-20070179264-A1 Copolymer of 8-methyl-8-methoxycarbonyltetracyclo[4.4.0.12,5.17,10]-3-dodecene or derivative with tricyclo[4.3.0.12,5]deca-3,7-diene or derivative; can be stretched even at low temperature around the glass transition temperature without causing cloudiness; excellent heat resistance and optical properties JSR CORPORATION (JP) 2007-08-02 — — US disclosed
EP-1739113-A1 CYCLOOLEFIN COPOLYMER OBTAINED BY RING-OPENING POLYMERIZATION, USE THEREOF, AND PROCESS FOR PRODUCING RETARDATION PLATE COMPRISING THE COPOLYMER JSR Corporation (JP) 2007-01-03 — — EP disclosed
US-RE30752-E CHEMICAL REACTANT FOR PROTECTING AMINO OR IMINO GROUPS FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1981-09-29 — — US disclosed
US-4010178-A Carbonic acid esters, and the preparation thereof and their use FUJISAWA PHARMACEUTICAL CO., LTD. (JA) 1977-03-01 — — US disclosed
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