Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP10 | Q53GL7 | 7/20 | 0.39 |
| ▸ | PARP15 | Q460N3 | 6/20 | 0.39 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.36 |
| ▸ | MAOA | P21397 | 2/20 | 0.35 |
| ▸ | MAOB | P27338 | 2/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.34 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.34 |
| ▸ | HTR3A | P46098 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.34 |
| ▸ | TLR4 | O00206 | 1/20 | 0.33 |
| ▸ | TLR2 | O60603 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4997137 | 0.99 | PARP10 (0.38) | PARP10PARP15PDK2PTGS2MAOA | |
| SCHEMBL4990177 | 0.85 | ABL1 (0.34) | PDK2PTGS2MAOAMAOBPTGS1 | |
| SCHEMBL5002150 | 0.84 | CA1 (0.31) | — | |
| SCHEMBL4991069 | 0.84 | ABL1 (0.33) | PDK2PTGS2MAOBPTGS1 | |
| SCHEMBL4996612 | 0.84 | MCHR1 (0.32) | — | |
| SCHEMBL446602 | 0.83 | CA1 (0.38) | PTGS2PTGS1 | |
| SCHEMBL445117 | 0.82 | CA1 (0.39) | PTGS2PTGS1 | |
| SCHEMBL4995783 | 0.82 | BACE1 (0.32) | — | |
| SCHEMBL4996700 | 0.82 | CA1 (0.37) | PDK2 | |
| SCHEMBL5002059 | 0.81 | KMT2A (0.38) | PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371503-B2 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |