SCHEMBL5010104

SCHEMBL5010104

CCN(Cc1ccccc1)c1ccc(C(c2ccc(OC)cc2)c2ccc(N(CC)Cc3ccccc3)cc2C)c(C)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 4/20 0.46
CNR1 P21554 3/20 0.46
TSHR P16473 2/20 0.44
S1PR1 P21453 3/20 0.43
NPC1 O15118 1/20 0.42
POLB P06746 1/20 0.42
MAPK1 P28482 2/20 0.41
NR1H2 P55055 1/20 0.40
NR1H3 Q13133 1/20 0.40
ALDH1A1 P00352 2/20 0.40
LMNA P02545 2/20 0.40
NPSR1 Q6W5P4 1/20 0.40
SLC2A1 P11166 1/20 0.40
DHFR P00374 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
SIRT5 Q9NXA8 1/20 0.38
GAA P10253 1/20 0.38
MAPT P10636 1/20 0.38
PKM P14618 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9483197 0.92 TSHR (0.53) CNR2CNR1TSHRS1PR1MAPK1
SCHEMBL5011808 0.89 TSHR (0.54) CNR2CNR1TSHRS1PR1MAPK1
SCHEMBL6252652 0.89 TSHR (0.53) CNR2CNR1TSHRS1PR1MAPK1
SCHEMBL3190991 0.88 SLC2A1 (0.47) CNR2CNR1NPC1MAPK1ALDH1A1
SCHEMBL5011923 0.87 TSHR (0.48) CNR2CNR1TSHRS1PR1MAPK1
SCHEMBL11104541 0.87 TSHR (0.51) CNR2CNR1TSHRS1PR1MAPK1
SCHEMBL12342188 0.85 MAPT (0.44) CNR2CNR1NPC1MAPK1ALDH1A1
SCHEMBL11520299 0.85 CYP2C19 (0.51) CNR2TSHRS1PR1MAPK1NR1H2
SCHEMBL10596976 0.84 TSHR (0.44) CNR2CNR1TSHRS1PR1NPC1
SCHEMBL5011777 0.84 TSHR (0.56) CNR2CNR1TSHRS1PR1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed