SCHEMBL501087

SCHEMBL501087

C=CCOCCOC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28201514 0.97 MEN1 (0.41)
SCHEMBL31755644 0.97 MEN1 (0.41)
SCHEMBL31755962 0.97 MEN1 (0.41)
SCHEMBL9229605 0.97 MEN1 (0.41)
SCHEMBL17082940 0.97 MEN1 (0.41)
SCHEMBL153914 0.85 POLB (0.52)
SCHEMBL17229561 0.84 MEN1 (0.40)
SCHEMBL5611784 0.84 MEN1 (0.40)
SCHEMBL8753814 0.82 POLB (0.50)
SCHEMBL7521085 0.82 POLB (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2198009-A1 CELL CULTURE ARTICLE AND METHODS THEREOF Corning Incorporated (US) 2010-06-23 EP claimed
WO-2009048567-A1 CELL CULTURE ARTICLE AND METHODS THEREOF CORNING INCORPORATED (US) 2009-04-16 WO claimed
US-20090098645-A1 Cell culture article and methods thereof CORNING INCORPORATED 2009-04-16 US claimed
US-5641967-A INCREASED PHOTOSTIMULATED LUMINESCENCE EASTMAN KODAK COMPANY (US) 1997-06-24 US claimed
US-5362613-A Silver halide photographic material having layers including light-sensitive silver halide emulsion layer on support and layer containing cationic high molecular weight compound with quaternized acrylic ester or amide units FUJI PHOTO FILM CO., LTD. (JP) 1994-11-08 US claimed
US-4346027-A UNSATURATED OXYGEN POLYMER AND A POLYOL MONSANTO COMPANY (US) 1982-08-24 US claimed
EP-0048599-A1 Air-drying compositions for treating fibrous substrates MONSANTO COMPANY (US) 1982-03-31 EP claimed
JP-2001705-A None JP disclosed
US-20260002005-A1 DISULFUR DICHLORIDE AND ALKENYL ETHERS ADDITIVES FOR MOONEY JUMP GOODYEAR TIRE & RUBBER (US) 2026-01-01 US disclosed
US-11693317-B2 Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
CN-110079276-A Heat circulating system composition and heat circulating system AGC株式会社 2019-08-02 CN disclosed
CN-106029854-B Composition for heat cycle system and heat cycle system AGC株式会社 2019-06-14 CN disclosed
CN-106062159-B Composition for heat cycle system and heat cycle system AGC株式会社 2019-04-16 CN disclosed
US-4203716-A Photographic elements having hydrophilic colloid layers containing hydrophobic addenda uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1980-05-20 US disclosed
US-4199363-A Processes for achieving uniform, efficient distribution of hydrophobic materials through hydrophilic colloid layers and loaded latex compositions EASTMAN KODAK COMPANY (US) 1980-04-22 US disclosed
US-4133687-A Photographic elements having hydrophilic colloid layers containing compounds having activator precursors and hydrophobic developing agents uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1979-01-09 US disclosed
US-4070189-A CATIONIC POLYBENZYLVINYL AMMONIUM OR PHOSPHONIUM SALT EASTMAN KODAK COMPANY (US) 1978-01-24 US disclosed
US-4055429-A Inhibitor barrier layers for photographic materials EASTMAN KODAK COMPANY (US) 1977-10-25 US disclosed
US-4046577-A PHOTOREACTIVE COMPOSITIONS COMPRISING POLYMERS CONTAINING ALKOXYAROMATIC GLYOXY GROUPS THE RICHARDSON COMPANY (US) 1977-09-06 US disclosed
US-3958995-A Photographic elements containing cross-linked mordants and processes of preparing said elements EASTMAN KODAK COMPANY (US) 1976-05-25 US disclosed