⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28207783 | 0.85 | NR5A2 (0.35) | — | |
| SCHEMBL3929681 | 0.79 | — | — | |
| SCHEMBL8771894 | 0.74 | GAA (0.32) | — | |
| SCHEMBL22260997 | 0.73 | GAA (0.34) | — | |
| SCHEMBL9461311 | 0.72 | GAA (0.31) | — | |
| SCHEMBL11175160 | 0.71 | GLRA3 (0.37) | — | |
| SCHEMBL5468888 | 0.70 | VCAM1 (0.33) | — | |
| SCHEMBL6633975 | 0.70 | PTGS1 (0.31) | — | |
| SCHEMBL21822067 | 0.68 | GAA (0.37) | — | |
| SCHEMBL22260995 | 0.68 | GAA (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105683313-B | Purposes of 2- (2- hydroxyphenyl) benzotriazole cpd in coating as UV absorbent | 巴斯夫欧洲公司 | 2019-09-17 | — | — | CN | claimed |
| EP-0195898-B1 | A METHOD OF INCREASING THE LIGHT FATIGUE RESISTANCE OF A PHOTOCHROMIC COMPOSITION AND PHOTOCHROMIC COMPOSITION | AMERICAN OPTICAL CORPORATION (US) | 1988-11-02 | — | — | EP | claimed |
| EP-0090530-B1 | NON-YELLOWING POLYMER COMPOSITION | THE DOW CHEMICAL COMPANY (US) | 1988-06-01 | — | — | EP | claimed |
| EP-0195898-A1 | A method of increasing the light fatigue resistance of a photochromic composition and photochromic composition | AMERICAN OPTICAL CORPORATION (US) | 1986-10-01 | — | — | EP | claimed |
| US-11697716-B2 | Process for producing a polyamide powder by precipitation | BASF SE (Ellwanger & Baier Patentanwälte) (DE) | 2023-07-11 | — | — | US | disclosed |
| CN-113302216-A | Limonene-based (meth) acrylates for 3D printing | 巴斯夫欧洲公司 | 2021-08-24 | — | — | CN | disclosed |
| CN-112639034-A | UV curable composition for 3D printing | 巴斯夫欧洲公司 | 2021-04-09 | — | — | CN | disclosed |
| CN-112638968-A | Photocurable composition for 3D printing | 巴斯夫欧洲公司 | 2021-04-09 | — | — | CN | disclosed |
| US-10815377-B2 | Resin composition, resin molding, method for manufacturing plated resin molding, and method for manufacturing antenna-equipped portable electronic device part | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2020-10-27 | — | — | US | disclosed |
| CN-106715560-B | Organic oxygroup acid imide is used as the purposes of radical-forming agent in the plastic, generates the method for free radical and the purposes of this method | 弗劳恩霍弗应用研究促进协会 | 2019-08-27 | — | — | CN | disclosed |
| US-20180298190-A1 | RESIN COMPOSITION, RESIN MOLDING, METHOD FOR MANUFACTURING PLATED RESIN MOLDING, AND METHOD FOR MANUFACTURING ANTENNA-EQUIPPED PORTABLE ELECTRONIC DEVICE PART | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2018-10-18 | — | — | US | disclosed |
| CN-108495888-A | Additive mixture for stabilizing polyols and polyurethanes | 巴斯夫欧洲公司 | 2018-09-04 | — | — | CN | disclosed |
| EP-0350009-B1 | Photochromic compound and photochromic composition | KUREHA CHEMICAL IND CO LTD (JP) | 1997-10-08 | — | — | EP | disclosed |
| US-5283273-A | With sterically hindered amine; zinc, calcium, magnesium and/or barium compound; a 1,3-dicarbonyl compound: no organotin or hydrotalcite compounds and no blowing or foaming agents | CIBA-GEIGY CORPORATION (US) | 1994-02-01 | — | — | US | disclosed |
| US-5198130-A | Zinc thiophosphates, tetramethylpiperidine derivatives | CIBA-GEIGY CORPORATION (US) | 1993-03-30 | — | — | US | disclosed |
| US-4897438-A | BLEND WITH A PHENOLIC RESIN | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1990-01-30 | — | — | US | disclosed |
| EP-0350009-A1 | Photochromic compound and photochromic composition | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1990-01-10 | — | — | EP | disclosed |
| EP-0195898-B1 | A METHOD OF INCREASING THE LIGHT FATIGUE RESISTANCE OF A PHOTOCHROMIC COMPOSITION AND PHOTOCHROMIC COMPOSITION | AMERICAN OPTICAL CORPORATION (US) | 1988-11-02 | — | — | EP | disclosed |
| EP-0090530-B1 | NON-YELLOWING POLYMER COMPOSITION | THE DOW CHEMICAL COMPANY (US) | 1988-06-01 | — | — | EP | disclosed |
| US-4720356-A | Photochromic composition resistant to fatigue | AMERICAN OPTICAL CORPORATION (US) | 1988-01-19 | — | — | US | disclosed |